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Chemical Product and Process Modeling

Chemical Product and Process Modeling

For free online access, please see www.degruyter.com/page/flavor

Aims and Scope

Chemical Product and Process Modeling is the premier forum for research on product and process modeling and simulation, both theoretical and applied. Thanks to its international editorial board, the journal assembles the best papers from around the world on modern modeling and simulation techniques. The range of topics includes equation-oriented modeling and simulation, sequential and modular simulation, performance of industrial process simulators, computational fluid dynamics, and environmental process modeling. The journal brings together chemical engineering researchers, practitioners, and software developers in a new forum for the international modeling and simulation community. Editors represent top engineering institutions across the globe, such as the University of Teheran, the Ecole Polytechnique de Montreal, Rutgers, the Indian Institute of Technology, the Technical University Hamburg, and the University of Buenos Aires.

Call for Papers

Call for Papers

Special Issue on Modeling, Identification and Control of Complex Process Systems

Fundamentals of engineering originate in understanding and elucidating the physical, chemical and/or biological phenomena in terms of correlations among parameters that determine the progression and state of the processes. These correlations form the basis for analysis, design, optimization and control of the processes of interest. Despite the significant efforts of many researchers in the past, there are still several theoretical and practical challenges related to the modeling, identification, optimization, model-based control and performance assessment that have yet to be overcome.

Chemical Product and Process Modeling invites submissions for a special issue on 'Modeling, Identification and Control of Complex Process Systems'. This issue is dedicated to recent results that address theoretical and practical problems associated with but not limited to complex chemical, petrochemical, electrochemical, pharmaceutical, biochemical and biomedical process systems.

Papers must contain high-quality original contributions and be prepared in accordance with the CPPM standards. Papers must be submitted here. Instructions to authors can be found here.

The due date for submissions is Febraury 15, 2012. Authors are encouraged to notify one the Guest Editors indicating their intention to submit a paper by January 1, 2012. Submissions will be peer reviewed and authors will be notified of the peer review results by June 1, 2012. Expected publication of the special issue is August 2012.

For additional information, please contact one of the Guest Editors.

Guest Editors:

Zoltan K. Nagy
Department of Chemical Engineering
Loughborough University, UK
Tel: +44 (0) 1509 2225 16
E-mail: z.k.nagy@lboro.ac.uk

Srinivas Karra
Applied Manufacturing Technologies
Houston, TX, USA
Tel: +1 (0) 806 282 7626
E-mail: srinivas.karra@applied-mt.com

Ali Mesbah
Delft Center for Systems and Control
Delft University of Technology, The Netherlands
Tel: +31 (0) 15 2785056
E-mail: ali.mesbah@tudelft.nl

Policies for Chemical Product and Process Modeling

Philosophy of Chemical Product and Process Modeling

The Journal of Chemical Product and Process Modeling seeks to publish original peer-reviewed and high quality contributions including review articles, full-length research papers, R&D notes, short communications, power point presentations, scientific animations and movies, colored graphs and even voice files which are not possible to publish in the traditional journals. Articles accepted by the journal are expected to make an important and long-lasting contribution to the field of chemical product and process modeling and simulation. Selected papers from the international conferences on the field are also welcome to be submitted to the journal. Qualified papers submitted from developing countries will also receive special attention. For more information, please see the Chemical Product and Process Modeling Aims and Scope page.

Who Can Submit?

Anyone may submit an original article to be considered for publication in Chemical Product and Process Modeling provided he or she owns the copyright to the work being submitted or is authorized by the copyright owner or owners to submit the article. Authors are the initial owners of the copyrights to their works (an exception in the non-academic world to this might exist if the authors have, as a condition of employment, agreed to transfer copyright to their employer).

General Submission Rules

A submitted article is assigned to a single editor, who oversees the editorial process, and who ultimately decides whether the submission should be accepted, sent back for revisions or rejected. The editorial decision is based on reviews of the submission by peers. Chemical Product and Process Modeling will have two reviews of each submission. Moreover, a decision is guaranteed within ten weeks.

If Chemical Product and Process Modeling accepts the article, the author would be asked to send an electronic version of the article according to bepress formatting requirements. The author would also be required to agree to the publication agreement. If the author agrees, then the article would be published shortly after receipt of the final electronic version. Should the author not agree, then the article is considered withdrawn. If the author is invited to revise and resubmit, then whether and when this is done would be up to the author. The author could, at this stage, withdraw the article if he/she wishes. The author must notify the editors of his/her intention to resubmit within 30 days. During that time, the paper cannot be submitted to another journal (electronic or hardcopy).

Any original work in the broad field of chemical product and process modeling and simulation can be submitted.

Submitted articles cannot have been previously published, nor be forthcoming in an archival journal or book (print or electronic). Please note: "publication" in a working-paper series does not constitute prior publication. In addition, by submitting material to Chemical Product and Process Modeling, the author is stipulating that the material is not currently under review at another journal (electronic or print) and that he or she will not submit the material to another journal (electronic or print) until the completion of the editorial decision process at Chemical Product and Process Modeling. If you have concerns about the submission terms for Chemical Product and Process Modeling, please contact the editors.

Formatting Requirements

Chemical Product and Process Modeling has no general rules about the formatting of articles upon initial submission. There are, however, rules governing the formatting of the final submission. See Final Manuscript Preparation Guidelines for bepress journals. Although bepress can provide limited technical support, it is ultimately the responsibility of the author to produce an electronic version of the article as a high-quality PDF (Adobe's Portable Document Format) file, or a Microsoft Word, WordPerfect or RTF file that bepress can convert to a PDF file.

It is understood that the current state of technology of Adobe's Portable Document Format (PDF) is such that there are no, and can be no, guarantees that documents in PDF will work perfectly with all possible hardware and software configurations that readers may have.

Copyright and Open Access Permissions

As further described in our submission agreement, in consideration for publication of the article, the authors assign to De Gruyter all copyright in the article, subject to the expansive personal-use exceptions described below.

Attribution and Usage Policies

Reproduction, posting, transmission or other distribution or use of the article or any material therein, in any medium as permitted by a personal-use exemption or by written agreement of De Gruyter, requires credit to De Gruyter as copyright holder (e.g., De Gruyter© 201).

Personal-use Exceptions

The following uses are always permitted to the author(s) and do not require further permission from De Gruyter provided the author does not alter the format or content of the articles, including the copyright notification:

Posting of the article on the author(s) personal website, provided that the website is non-commercial;
Posting of the article on the internet as part of a non-commercial open access institutional repository or other non-commercial open access publication site affiliated with the author(s)'s place of employment (e.g., a Phrenology professor at the University of Southern North Dakota can have her article appear in the University of Southern North Dakota's Department of Phrenology online publication series);
Posting of the article on a non-commercial course website for a course being taught by the author at the university or college employing the author; and
Storage and back-up of the article on the author's computer(s) and digital media (e.g., diskettes, back-up servers, Zip disks, etc.), provided that the article stored on these computers and media is not readily accessible by persons other than the author(s).

Editorial Board
Rahmat Sotudeh-Gharebagh University of Tehran, Iran sotudeh@ut.ac.ir
Navid Mostoufi  University of Tehran, Iran mostoufi@ut.ac.ir
Jamal Chaouki  Ecole Polytechnique de Montreal, Canada jamal.chaouki@polymtl.ca

Associate Editors
Ricardo Aguilar-López CINVESTAV-IPN, México raguilar@cinvestav.mx
Sameer Al-Asheh Jordan University of Science and Technology, Jordan alasheh@just.edu.jo
Adel Al-Taweel  Dalhouse University, Canada al.taweel@dal.ca
Sorin Bildea  Delft University of Technology, Netherlands c.s.bildea@tudelft.nl
Miryan Cassanello  Universidad de Buenos Aires, Argentina miryan@di.fcen.uba.ar
Alkis Constantinides  Rutgers, State University of New Jersey, USA constant@soemail.rutgers.edu
Marc-Olivier Coppens  Rensselaer Polytechnic Institute, NY, USA coppens@rpi.edu
Mario R. Eden Auburn University, AL, USA edenmar@auburn.edu
Eugénio C. Ferreira Universidade do Minho, Portugal ecferreira@deb.uminho.pt
Iftikhar Karimi  National University of Singapore, Singapore cheiak@nus.edu.sg
Eugeny Kenig  University of Paderborn, Germany eugeny.kenig@upb.de
Jiri Klemes The University of Manchester, UK jiri.klemes@manchester.ac.uk
Andrzej Kraslawski University of Lapeenranta, Finland andrzej.kraslawski@lut.fi
Surendra Kumar Indian Institute of Technology Roorkee, India skumar@iitr.ernet.in
Jae W. Lee The City College of New York, NY, USA lee@che.ccny.cuny.edu
Patrick Linke Texas A&M University at Qatar, Qatar patrick.linke@qatar.tamu.edu
Norman W. Loney New Jersey Institute of Technology, USA loney@adm.njit.edu
Davide Manca Politecnico of Milano, Italy davide.manca@polimi.it
Mark Nelson University of Wollongong, Australia nelsonm@member.ams.org
Heinz A. Preisig  Norwegian University of Science and Technology, Norway heinz.preisig@chemeng.ntnu.no
Fernando Preto  CANMET Energy Technology Centre, Canada preto@nrcan.gc.ca
Todd Pugsley  University of Saskatchewan, Canada todd.pugsley@usask.ca
Luis Puigjaner  Technical University of Catalonia, Spain luis.puigjaner@upc.edu
Jean-Michel Reneaume  Ecole Nationale Supérieure en Génie des Technologies Industrielles, ENSGTI, France jean-michel.reneaume@univ-pau.fr
Sohrab Rohani  University of Western Ontario, Canada rohani@eng.uwo.ca
Panos Seferlis  Chemical Process Engineering Research Institute, Greece seferlis@cperi.certh.gr
Paul Singh  University of California, Davis, USA rpsingh@ucdavis.edu
Paul Stuart  Ecole Polytechnique de Montreal, Canada paul.stuart@polymtl.ca
Bill Svrcek  University of Calgary, Canada svrcek@ucalgary.ca
Jan Verstraete  Institut Français du Pétrole, France jan.verstraete@ifp.fr
Johan Warna  Abo Akademi University, Finland jwarna@abo.fi
Joachim Werther  Technical University Hamburg, Germany Werther@tu-harburg.de
Brent Young  University of Auckland, New Zealand b.young@auckland.ac.nz
Yifang Zhu Texas A&M University-Kingsville, USA YZhu@eng.tamuk.edu
 

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