Jump to ContentJump to Main Navigation

New Journal at De Gruyter!

International Journal of Chemical Reactor Engineering

Ed. by de Lasa, Hugo / Xu, Charles Chunbao

1 Issue per year

IMPACT FACTOR 2013: 0.584

Modeling of Chemical Vapor Deposition in a Fluidized Bed Reactor Based on Discrete Particle Simulation

Gregor Czok1 / Mao Ye2 / J. A. M. Hans Kuipers3 / Joachim Werther4

1Hamburg University of Technology,

2University of Twente, Enschede, The Netherlands,

3University of Twente, Enschede, The Netherlands,

4Hamburg University of Technology,

Citation Information: International Journal of Chemical Reactor Engineering. Volume 3, Issue 1, ISSN (Online) 1542-6580, DOI: 10.2202/1542-6580.1234, December 2005

Publication History

Published Online:
2005-12-28

For better understanding the process of particle coating by chemical vapor deposition (CVD) in the fluidized bed, the simulation of the deposition process was combined with a discrete particle model (DPM). Based on the experimental results of the thermal decomposition of tri-isobutyl-aluminum (TIBA) to produce aluminum onto glass beads, mechanisms on the micro-scale were investigated by single particle tracking. Zones of excessive growth as well as zones of insufficient mixing were identified. In particular, the take-up of aluminum was traced for selected particles that exhibited a large mass of deposited aluminum what in turn provides insight into the homogeneity and quantity of the coating throughout the bed material.

Keywords: Chemical Vapor Deposition; Discrete Particle Modeling; Fluidized Bed Reactor; Particle Coating

Comments (0)

Please log in or register to comment.
Users without a subscription are not able to see the full content. Please, subscribe or login to access all content.