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Pure and Applied Chemistry

The Scientific Journal of IUPAC

Ed. by Burrows, Hugh / Weir, Ron / Stohner, Jürgen

12 Issues per year

IMPACT FACTOR 2013: 3.112
Rank 41 out of 148 in category Multidisciplinary Chemistry in the 2013 Thomson Reuters Journal Citation Report/Science Edition

SCImago Journal Rank (SJR): 1.172
Source Normalized Impact per Paper (SNIP): 1.106

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Mechanisms of silicon etching in fluorine- and chlorine-containing plasmas

D. L. Flamm

Citation Information: Pure and Applied Chemistry. Volume 62, Issue 9, Pages 1709–1720, ISSN (Online) 1365-3075, ISSN (Print) 0033-4545, DOI: 10.1351/pac199062091709, January 2009

Publication History

Published Online:
2009-01-01

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