Jump to ContentJump to Main Navigation

Pure and Applied Chemistry

The Scientific Journal of IUPAC

Ed. by Burrows, Hugh / Weir, Ron / Stohner, Jürgen

12 Issues per year

IMPACT FACTOR 2013: 3.112
Rank 41 out of 148 in category Multidisciplinary Chemistry in the 2013 Thomson Reuters Journal Citation Report/Science Edition

SCImago Journal Rank (SJR): 1.172
Source Normalized Impact per Paper (SNIP): 1.106

VolumeIssuePage

Issues

Atmospheric-pressure plasma sources: Prospective tools for plasma medicine

Klaus Dieter Weltmann1 / Eckhard Kindel1 / Thomas von Woedtke1 / Marcel Hähnel1 / Manfred Stieber1 / Ronny Brandenburg1

1Leibniz Institute for Plasma Science and Technology e.V. (INP Greifswald), Felix-Hausdorff-Str. 2, D-17489 Greifswald, Germany

Conference

International Symposium on Plasma Chemistry (ISPC-19), International Symposium on Plasma Chemistry, ISPC, Plasma Chemistry, 19th, Bochum, Germany, 2009-07-26–2009-07-31

Citation Information: Pure and Applied Chemistry. Volume 82, Issue 6, Pages 1223–1237, ISSN (Online) 1365-3075, ISSN (Print) 0033-4545, DOI: 10.1351/PAC-CON-09-10-35, April 2010

Publication History

Published Online:
2010-04-20

Plasma-based treatment of chronic wounds or skin diseases as well as tissue engineering or tumor treatment is an extremely promising field. First practical studies are promising, and plasma medicine as an independent medical field is emerging worldwide. While during the last years the basics of sterilizing effects of plasmas were well studied, concepts of tailor-made plasma sources which meet the technical requirements of medical instrumentation are still less developed. Indeed, studies on the verification of selective antiseptic effects of plasmas are required, but the development of advanced plasma sources for biomedical applications and a profound knowledge of their physics, chemistry, and parameters must be contributed by physical research. Considering atmospheric-pressure plasma sources, the determination of discharge development and plasma parameters is a great challenge, due to the high complexity and limited diagnostic approaches. This contribution gives an overview on plasma sources for therapeutic applications in plasma medicine. Selected specific plasma sources that are used for the investigation of various biological effects are presented and discussed. Furthermore, the needs, prospects, and approaches for its characterization from the fundamental plasma physical point of view will be discussed.

Keywords: atmospheric-pressure plasma; barrier discharge; biomedical applications; decontamination; plasma jet; plasma medicine; sterilization; temperature; (V)UV-radiation

References

  • 1

    [CrossRef], M. Laroussi. IEEE Trans. Plasma Sci. 37, 714 (2009).

  • 2

    [CrossRef], G. Fridman, G. Friedman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, A. Fridman. Plasma Process. Polym. 5, 503 (2008).

  • 3

    E. Stoffels, I. E. Kieft, R. E. J. Sladek, E. P. van der Laan, D. W. Slaaf. Crit. Rev. Biomed. Eng. 34 (2004).

  • 4

    [CrossRef], E. Stoffels. Contrib. Plasma Phys. 47, 40 (2007).

  • 5

    [CrossRef], M. G. Kong, G. Kroesen, G. Morfill, T. Nosenko, T. Shimizu, J. van Dijk, J. L. Zimmermann. New J. Phys. 11, 115012 (2009).

  • 6

    [CrossRef], S. Lerouge, M. R. Wertheimer, L. Yahia. Plasmas Polym. 6, 175 (2001).

  • 7

    [CrossRef], M. Laroussi. Plasma Processes Polym. 2, 391 (2005).

  • 8

    [CrossRef], M. K. Boudam, M. Moisan, B. Saoudi, C. Popovici, N. Gherardi, F. Massines. J. Phys. D: Appl. Phys. 39, 3494 (2006).

  • 9

    [CrossRef], R. Ben Gadri, J. R. Roth, T. C. Montie, K. Kelly-Wintenberg, P. P. Y. Tsai, D. J. Helfritch, P. Feldman, D. M. Sherman, F. Karakaya, Z. Y. Chen. Surf. Coat. Technol. 131, 528 (2000).

  • 10

    [CrossRef], M. Heise, W. Neff, O. Franken, P. Muranyi, J. Wunderlich. Plasmas Polym. 9, 23 (2004).

  • 11

    [CrossRef], M. Moisan, J. Barbeau, S. Moreau, J. Pelletier, M. Tabrizian, L. H. Yahia. Int. J. Pharm. 226, 1 (2001).

  • 12

    [CrossRef], K. D. Weltmann, R. Brandenburg, T. von Woedtke, J. Ehlbeck, R. Foest, M. Stieber, E. Kindel. J. Phys. D: Appl. Phys. 41, 194008 (2008).

  • 13

    [CrossRef], J. Raiser, M. Zenker. J. Phys. D: Appl. Phys. 39, 3520 (2006).

  • 14

    [CrossRef], K. R. Stalder, J. Woloszko. Contrib. Plasma Phys. 47, 64 (2007).

  • 15

    [CrossRef], K. R. Stalder, D. F. McMillen, J. Woloszko. J. Phys. D: Appl. Phys. 38, 1728 (2005).

  • 16

    [CrossRef], S. Yonson, S. Coulombe, V. Leveille, R. L. Leask. J. Phys. D: Appl. Phys. 39, 3508 (2006).

  • 17

    [CrossRef], S. Coulombe, V. Leveille, S. Yonson, R. L. Leask. Pure Appl. Chem. 78, 1147 (2006).

  • 18

    [CrossRef], G. Fridman, M. Peddinghaus, H. Ayan, A. Fridman, M. Balasubramanian, A. Gutsol, A. Brooks, G. Friedman. Plasma Chem. Plasma Process. 26, 425 (2006).

  • 19

    [CrossRef], R. E. J. Sladek, E. Stoffels, R. Walraven, P. J. A. Tielbeek, R. A. Koolhoven. IEEE Trans. Plasma Sci. 32, 1540 (2004).

  • 20

    [CrossRef], C. Q. Jiang, M. T. Chen, C. Schaudinn, A. Gorur, P. T. Vernier, J. W. Costerton, D. E. Jaramillo, P. P. Sedghizadeh, M. A. Gundersen. IEEE Trans. Plasma Sci. 37, 1190 (2009).

  • 21

    W. Stolz, M. Georgi, H.-U. Schmidt, K. Ramrath, R. Pompl, T. Shimizu, B. Steffes, W. Bunk, B. Peters, F. Jamitzky, G. Morfill. First International Conference on Plasma Medicine (ICPM-1), Corpus Christi, TX, USA (2007).

  • 22

    G. Isbary, W. Stolz, M. Georgi, H.-U. Schmidt, R. Pompl, T. Shimizu, B. Steffes, W. Bunk, F. Jamitzky, S. Fujii, G. Morfill. Second International Conference on Plasma Medicine (ICPM-2), San Antonio, TX, USA (2009).

  • 23

    [CrossRef], F. Iza, G. J. Kim, S. M. Lee, J. K. Lee, J. L. Walsh, Y. T. Zhang, M. G. Kong. Plasma Process. Polym. 5, 322 (2008).

  • 24

    [CrossRef], G. Fridman, A. D. Brooks, M. Balasubramanian, A. Fridman, A. Gutsol, H. N. Vasilets, A. Ayan, G. Friedman. Plasma Process. Polym. 4, 370 (2007).

  • 25

    [CrossRef], M. Laroussi, T. Akan. Plasma Process. Polym. 4, 777 (2007).

  • 26

    [CrossRef], U. Kogelschatz. Plasma Chem. Plasma Process. 23, 1 (2003).

  • 27

    [CrossRef], H. E. Wagner, R. Brandenburg, K. V. Kozlov, A. Sonnenfeld, P. Michel, J. F. Behnke. Vacuum 71, 417 (2003).

  • 28

    [CrossRef], K. H. Becker, K. H. Schoenbach, J. G. Eden. J. Phys. D: Appl. Phys. 39, R55 (2006).

  • 29

    [CrossRef], U. Kogelschatz. Contrib. Plasma Phys. 47, 80 (2007).

  • 30

    [CrossRef], S. J. Park, J. G. Eden, J. Chen, C. Liu. Appl. Phys. Lett. 79, 2100 (2001).

  • 31

    [CrossRef], J. Park, I. Henins, H. W. Herrmann, G. S. Selwyn, J. Y. Jeong, R. F. Hicks, D. Shim, C. S. Chang. Appl. Phys. Lett. 76, 288 (2000).

  • 32

    [CrossRef], A. Schutze, J. Y. Jeong, S. E. Babayan, J. Park, G. S. Selwyn, R. F. Hicks. IEEE Trans. Plasma Sci. 26, 1685 (1998).

  • 33

    [CrossRef], E. Stoffels, A. J. Flikweert, W. W. Stoffels, G. M. W. Kroesen. Plasma Sources Sci. Technol. 11, 383 (2002).

  • 34

    [CrossRef], I. E. Kieft, J. L. V. Broers, V. Caubet-Hilloutou, D. W. Slaaf, F. C. S. Ramaekers, E. Stoffels. Bioelectromagnetics 25, 362 (2004).

  • 35

    [CrossRef], I. E. Kieft, D. Darios, A. J. M. Roks, E. Stoffels. IEEE Trans. Plasma Sci. 33, 771 (2005).

  • 36

    [CrossRef], R. E. J. Sladek, E. Stoffels. J. Phys. D: Appl. Phys. 38, 1716 (2005).

  • 37

    E. Stoffels, R. E. J. Sladek, I. E. Kieft. Phys. Scr. 107, 4 (2004).

  • 38

    [CrossRef], E. Stoffels, I. E. Kieft, R. E. J. Sladek. J. Phys. D: Appl. Phys. 36, 2908 (2003).

  • 39

    [CrossRef], E. Stoffels, I. E. Kieft, R. E. J. Sladek, L. J. M. van den Bedem, E. P. van der Laan, M. Steinbuch. Plasma Sources Sci. Technol. 15, S169 (2006).

  • 40

    [CrossRef], K. D. Weltmann, R. Brandenburg, T. von Woedtke, J. Ehlbeck, R. Foest, M. Stieber, E. Kindel. J. Phys. D: Appl. Phys. 41, 194008 (2008).

  • 41

    [CrossRef], K. D. Weltmann, E. Kindel, R. Brandenburg, C. Meyer, R. Bussiahn, C. Wilke, T. von Woedtke. Contrib. Plasma Phys. 49, 631 (2009).

  • 42

    H. Lange, R. Foest, J. Schafer, K. D. Weltmann. IEEE Trans. Plasma Sci. 37, 859 (2009).

  • 43

    [CrossRef], R. Foest, E. Kindel, H. Lange, A. Ohl, M. Stieber, K. D. Weltmann. Contrib. Plasma Phys. 47, 119 (2007).

  • 44

    R. Brandenburg, H. Lange, T. von Woedtke, M. Stieber, E. Kindel, J. Ehlbeck, K. D. Weltmann. IEEE Trans. Plasma Sci. 37, 877 (2009). [CrossRef]

  • 45

    [CrossRef], K.-D. Weltmann, E. Kindel, R. Brandenburg, C. Meyer, R. Bussiahn, C. Wilke, T. von Woedtke. Contrib. Plasma Phys. 49, 631 (2009).

  • 46

    [CrossRef], V. I. Gibalov, G. J. Pietsch. J. Phys. D: Appl. Phys. 33, 2618 (2000).

  • 47

    [CrossRef], G. J. Pietsch. Contrib. Plasma Phys. 41, 620 (2001).

  • 48

    [CrossRef], M. Hähnel, T. von Woedtke, K.-D. Weltmann. Plasma Process. Polym. 7, 244 (2010).

  • 49

    [CrossRef], M. Hahnel, V. Bruser, H. Kersten. Plasma Process. Polym. 4, 629 (2007).

  • 50

    [CrossRef], K. Oehmigen, M. Hähnel, R. Brandenburg, C. Wilke, K.-D. Weltmann, T. von Woedtke. Plasma Process. Polym. 7, 250 (2010).

  • 51

    [CrossRef], U. Kogelschatz, B. Eliasson, W. Egli. J. Phys. IV 7, 47 (1997).

  • 52

    [CrossRef], Z. Falkenstein. J. Appl. Phys. 81, 5975 (1997).

  • 53

    [CrossRef], F. J. Trompeter, W. J. Neff, O. Franken, M. Heise, M. Neiger, S. H. Liu, G. J. Pietsch, A. B. Saveljew. IEEE Trans. Plasma Sci. 30, 1416 (2002).

  • 54

    [CrossRef], S. Tümmel, N. Mertens, J. Wang, W. Viöl. Plasma Process. Polym. 4, S465 (2007).

  • 55

    G. Fridman, A. Gutsol, V. Vasilets, A. Fridman, G. Friedman. ISPC 18 (Kyoto), p. 4 (2007).

  • 56

    G. Fridman, R. Sensing, S. Kalghatgi, A. Shereshevsky, M. Balasubramanian, A. Gutsol, V. Vasilets, A. Brooks, A. Fridman, G. Friedman. ISPC 18 (Kyoto), p. 4 (2007).

  • 57

    G. Fridman, A. Shereshevsky, M. Balasubramanian, M. Peddinghaus, A. Brooks, A. Gutsol, V. Vasilets, A. Fridman, G. Friedman. ISPC 18 (Kyoto), p. 4 (2007).

  • 58

    [CrossRef], U. Kogelschatz. IEEE Trans. Plasma Sci. 30, 1400 (2002).

  • 59

    H. E. Wagner, R. Brandenburg, K. V. Kozlov. J. Adv. Oxidation Technol. 7, 11 (2004).

  • 60

    [CrossRef], B. Eliasson, M. Hirth, U. Kogelschatz. J. Phys. D: Appl. Phys. 20, 1421 (1987).

  • 61

    [CrossRef], K. V. Kozlov, H. E. Wagner, R. Brandenburg, P. Michel. J. Phys. D: Appl. Phys. 34, 3164 (2001).

  • 62

    [CrossRef], C. Lukas, M. Spaan, V. Schulz-von der Gathen, M. Thomson, R. Wegst, H. F. Dobele, M. Neiger. Plasma Sources Sci. Technol. 10, 445 (2001).

  • 63

    [CrossRef], V. Schulz-von der Gathen, V. Buck, T. Gans, N. Knake, K. Niemi, S. Reuter, L. Schaper, J. Winter. Contrib. Plasma Phys. 47, 510 (2007).

  • 64

    [CrossRef], N. Mericam-Bourdet, M. Laroussi, A. Begum, E. Karakas. J. Phys. D: Appl. Phys. 42, 055207 (2009).

  • 65

    [CrossRef], B. L. Sands, B. N. Ganguly, K. Tachibana. IEEE Trans. Plasma Sci. 36, 956 (2008).

  • 66

    [CrossRef], M. Laroussi, W. Hynes, T. Akan, X. P. Lu, C. Tendero. IEEE Trans. Plasma Sci. 36, 1298 (2008).

  • 67

    [CrossRef], J. J. Shi, F. C. Zhong, J. Zhang, D. W. Liu, M. G. Kong. Phys. Plasmas 15, 013504 (2008).

  • 68

    [CrossRef], M. Teschke, J. Kedzierski, E. G. Finantu-Dinu, D. Korzec, J. Engemann. IEEE Trans. Plasma Sci. 33, 310 (2005).

Comments (0)

Please log in or register to comment.