Erratum to: Ultrafast Bessel beams: advanced tools for laser materials processing

Razvan Stoian
  • Corresponding author
  • Laboratoire Hubert Curien, UMR 5516 CNRS, Université de Lyon, Université Jean Monnet, 42000 Saint Etienne, France
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, Manoj K. Bhuyan
  • Laboratoire Hubert Curien, UMR 5516 CNRS, Université de Lyon, Université Jean Monnet, 42000 Saint Etienne, France
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, Guodong Zhang
  • State Key Laboratory of Transient Optics and Photonics, Xi’an Institute of Optics and Precision Mechanics, CAS, 710119 Xi’an, Shaanxi, China
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, Guanghua Cheng
  • State Key Laboratory of Transient Optics and Photonics, Xi’an Institute of Optics and Precision Mechanics, CAS, 710119 Xi’an, Shaanxi, China
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, Remy Meyer
  • Institut FEMTO-ST, Université de Franche-Comté, UMR 6174 CNRS, 25030 Besançon, France
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and Francois Courvoisier
  • Institut FEMTO-ST, Université de Franche-Comté, UMR 6174 CNRS, 25030 Besançon, France
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Erratum to: Razvan Stoian, Manoj K. Bhuyan, Guodong Zhang, Guanghua Cheng, Remy Meyer, and Francois Courvoisier. 2018. Ultrafast Bessel beams: advanced tools for laser materials processing. Advanced Optical Technologies. Volume 7, Issue 3, pages 165–174. (DOI:10.1515/aot-2018-0009):

In the online and the printed issue of Advanced Optical Technologies [1] an error in Figure 2 occurred. The scale in Figure 2A, D is 3 μm. The correct figure is published here.

Figure 2:
Figure 2:

Bessel beams interaction with transparent materials [61], [63]. (A) Input surface pattern generated by a singe shot tightly focused ultrashort (60 fs, 14 μJ) Bessel beam (θair=22°) on fused silica; scanning electron microscope (SEM) image. The Bessel ring pattern is recognizable. (B) A high aspect ratio structure in the form of a one-dimensional void in bulk fused silica generated by a single shot ps stretched low focused Bessel beam (2 ps, 26 μJ, θglass=4°), viewed as low refractive index domain by phase-contrast microscopy (PCM). (C) Positive refractive index engineering with multishot (n=500) ultrashort moderately focused Bessel beam (60 fs, 1 μJ, θglass=8°); PCM image [61]. Dark colors denote a positive index change and white colors a negative change, respectively. (D) Back surface (exit surface) nanoscale structure in fused silica induced by a single shot moderately-focused ps stretched laser pulse (5 ps, 14 μJ, θglass=8°); SEM image. (E) Nanoscale void in sapphire (140 fs, 2 μJ, θsapphire=15°) [62] drilled by a single laser pulse and viewed with SEM after FIB milling. The used energies correspond to fluence values in air (in the absence of nonlinear distortions) from several J/cm2 up to several tens of J/cm2. Laser direction is marked.

Citation: Advanced Optical Technologies 8, 6; 10.1515/aot-2019-0029

Reference

[1]

R. Stoian, M. Bhuyan, G. Cheng, G. Zhang, R. Meyer, et al., Adv. Opt. Technol. 7, 165–174 (2018).

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  • [1]

    R. Stoian, M. Bhuyan, G. Cheng, G. Zhang, R. Meyer, et al., Adv. Opt. Technol. 7, 165–174 (2018).

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    Bessel beams interaction with transparent materials [61], [63]. (A) Input surface pattern generated by a singe shot tightly focused ultrashort (60 fs, 14 μJ) Bessel beam (θair=22°) on fused silica; scanning electron microscope (SEM) image. The Bessel ring pattern is recognizable. (B) A high aspect ratio structure in the form of a one-dimensional void in bulk fused silica generated by a single shot ps stretched low focused Bessel beam (2 ps, 26 μJ, θglass=4°), viewed as low refractive index domain by phase-contrast microscopy (PCM). (C) Positive refractive index engineering with multishot (n=500) ultrashort moderately focused Bessel beam (60 fs, 1 μJ, θglass=8°); PCM image [61]. Dark colors denote a positive index change and white colors a negative change, respectively. (D) Back surface (exit surface) nanoscale structure in fused silica induced by a single shot moderately-focused ps stretched laser pulse (5 ps, 14 μJ, θglass=8°); SEM image. (E) Nanoscale void in sapphire (140 fs, 2 μJ, θsapphire=15°) [62] drilled by a single laser pulse and viewed with SEM after FIB milling. The used energies correspond to fluence values in air (in the absence of nonlinear distortions) from several J/cm2 up to several tens of J/cm2. Laser direction is marked.