High-power impulse magnetron sputtering (HIPIMS) was introduced in the late 1990s as a unique physical vapor deposition method. The technology utilizes magnetron sputtering cathodes and high peak power density of up to 3 kW cm–2 on the target. The plasma produces a metal flux with high degree of ionization. HIPIMS has been successfully used as a substrate pretreatment method to enhance coating adhesion by promoting local epitaxial growth. As a deposition technology, HIPIMS produces high-density microstructure films. It has been industrialized and has successful applications in hard, electronic, and optical coatings.
Conference
International Symposium on Plasma Chemistry (ISPC-19), International Symposium on Plasma Chemistry, ISPC, Plasma Chemistry, 19th, Bochum, Germany, 2009-07-26–2009-07-31
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