Abstract
Artificial manipulation and control of vortex dynamics in YBa2Cu3O7 (YBCO) films have always been a complex issue, especially since high thermal excitations but also strong vortex pinning capabilities coexist in this material. Thus, artificial nanofabrication strategies able to generate competing effects with intrinsic microstructural defects need to be achieved. Lithography tools are widely used to create model systems with controlled pinning potentials in superconductors. However, these techniques easily disturb the optimal oxygen film doping in YBCO films and consequently the overall performances degrades. We have optimized the use of two different high-resolution nanolithography approaches, Focused Ion Beam Milling and Electron Beam Lithography, to artificially and locally modify the pinning landscape of YBCO films grown by chemical solution deposition (CSD). Three different nanofabricated systems will be discussed, which resulted in ideal structures to manipulate vortex dynamics in CSD-YBCO thin films with strong intrinsic pinning centers. In particular, we observed artificial granularity effects, nanowall pinning, and positive and negative rectification effects. We will report on our understanding of all these effects and potential expectations.
