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BY-NC-ND 3.0 license Open Access Published by De Gruyter Open Access November 17, 2014

Deposition of Zn-containing films using atmospheric pressure plasma jet

  • Oleksandr Galmiz EMAIL logo , Monika Stupavska , Harm Wulff , Holger Kersten , Antonin Brablec and Mirko Cernak
From the journal Open Chemistry

Abstract

The purpose of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09.” In preliminary experiments Zn-containing films were deposited on the silicon substrates immersed in water solutions of Zn(NO3)2•6H2O salt. The surface composition of deposited films was analyzed by the XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have determined that the concentration of the zinc nitrate solution as well as changes in the deposition time resulted in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed.

Graphical Abstract

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Received: 2014-1-30
Accepted: 2014-5-14
Published Online: 2014-11-17

© 2015 Oleksandr Galmiz et al.

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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