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BY-NC-ND 3.0 license Open Access Published by De Gruyter Open Access November 17, 2014

Deposition of Zn-containing films using atmospheric pressure plasma jet

Oleksandr Galmiz, Monika Stupavska, Harm Wulff, Holger Kersten, Antonin Brablec and Mirko Cernak
From the journal Open Chemistry

Abstract

The purpose of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09.” In preliminary experiments Zn-containing films were deposited on the silicon substrates immersed in water solutions of Zn(NO3)2•6H2O salt. The surface composition of deposited films was analyzed by the XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have determined that the concentration of the zinc nitrate solution as well as changes in the deposition time resulted in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed.

Graphical Abstract

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Received: 2014-1-30
Accepted: 2014-5-14
Published Online: 2014-11-17

© 2015 Oleksandr Galmiz et al.

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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