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Accessible Unlicensed Requires Authentication Published by Oldenbourg Wissenschaftsverlag December 14, 2011

Process Control of CVD Deposition of Nanocrystalline Diamond Films by Plasma Diagnostics

Nicolas Woehrl and Volker Buck

Abstract

Ultrananocrystalline Diamond (UNCD) Films were deposited by MW-CVD from an Ar/H2/CH4 plasma. The plasma properties were measured in situ by optical emission spectroscopy and mass spectroscopy. The intensity of the C2 emission line was systematically varied as a key plasma parameter and a correlation with resulting film properties was found.


* Correspondence address: University of Duisburg-Essen, Faculty of Physics, Lotharstr. 1, Thin film technology group, 47057 Duisburg, Deutschland

Published Online: 2011-12-14
Published in Print: 2011-12-1

© by Oldenbourg Wissenschaftsverlag, Duisburg, Germany