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Licensed Unlicensed Requires Authentication Published by De Gruyter (O) December 14, 2011

Process Control of CVD Deposition of Nanocrystalline Diamond Films by Plasma Diagnostics

  • Nicolas Woehrl and Volker Buck


Ultrananocrystalline Diamond (UNCD) Films were deposited by MW-CVD from an Ar/H2/CH4 plasma. The plasma properties were measured in situ by optical emission spectroscopy and mass spectroscopy. The intensity of the C2 emission line was systematically varied as a key plasma parameter and a correlation with resulting film properties was found.

* Correspondence address: University of Duisburg-Essen, Faculty of Physics, Lotharstr. 1, Thin film technology group, 47057 Duisburg, Deutschland

Published Online: 2011-12-14
Published in Print: 2011-12-1

© by Oldenbourg Wissenschaftsverlag, Duisburg, Germany

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