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BY-NC-ND 3.0 license Open Access Published by De Gruyter Open Access September 21, 2012

Fabrication of superhydrophobic surface of stearic acid grafted zinc by using an aqueous plasma etching technique

  • Jinzhang Gao EMAIL logo , Yaping Li , Yan Li , Hongwei Liu and Wu Yang
From the journal Open Chemistry

Abstract

A stable superhydrophobic surface of stearic acid grafted zinc was fabricated with two steps, that is, the zinc surface was firstly treated with glow discharge electrolysis plasma (GDEP) and then followed by a grafted reaction of stearic acid onto the treated zinc surface. Results indicated that the wettability of zinc substrate changed from superhydrophily to superhyphodrobicity with a water contact angle (CA) up to 158° and a water sliding angle (SA) less than 5°. The surface morphology and composition were characterized by scanning electron microscopy (SEM) and X-ray diffraction (XRD), respectively.

[1] J.M. Xi, F. Lin, L. Jiang, Appl. Phys. Lett. 92, 053102 (2008) http://dx.doi.org/10.1063/1.283940310.1063/1.2839403Search in Google Scholar

[2] Z.G. Guo, W.M. Liu, B.L. Su, Appl. Phys. Lett. 92, 063104 (2008) http://dx.doi.org/10.1063/1.284166610.1063/1.2841666Search in Google Scholar

[3] M. Li, J. Zhai, H. Liu, Y.L. Song, L. Jiang, D.B. Zhu, J. Phys. Chem. B 107, 9954 (2003) http://dx.doi.org/10.1021/jp035562u10.1021/jp035562uSearch in Google Scholar

[4] X. Hong, X.F. Gao, L. Jiang, J. Am. Chem. Soc. 129, 1478 (2007) http://dx.doi.org/10.1021/ja065537c10.1021/ja065537cSearch in Google Scholar PubMed

[5] G.X. Li, B. Wang, Y. Liu, T. Tan, X.M. Song, H. Yan, Appl. Surf. Sci. 255, 3112 (2008) http://dx.doi.org/10.1016/j.apsusc.2008.08.10710.1016/j.apsusc.2008.08.107Search in Google Scholar

[6] C.S. Liu, Z.W. Li, L. Wang, Z. Xu, Key Eng. Mater. 368, 1374 (2008) http://dx.doi.org/10.4028/www.scientific.net/KEM.368-372.137410.4028/www.scientific.net/KEM.368-372.1374Search in Google Scholar

[7] K.K.S. Lau, J. Bico, K.B.K. Teo, M. Chhowalla, G.A.J. Amaratunga, W.I. Milne, G.H. McKinley, K.K. Gleason, Nano Let. 3, 1701 (2003) http://dx.doi.org/10.1021/nl034704t10.1021/nl034704tSearch in Google Scholar

[8] W. C. Wu, M. Chen, S. Liang, X.L. Wang, J.M. Chen, F. Zhou, J. Colloid Interface Sc. 326, 478 (2008) http://dx.doi.org/10.1016/j.jcis.2008.06.04110.1016/j.jcis.2008.06.041Search in Google Scholar PubMed

[9] E. Bormashenko, Colloids Surf. A 324, 47 (2008) http://dx.doi.org/10.1016/j.colsurfa.2008.03.02510.1016/j.colsurfa.2008.03.025Search in Google Scholar

[10] L. Feng, S. Li, Y. Li, H. Li, L. Zhang, J. Zhai, Y. Song, B. Liu, L. Jiang, D. Zhu, AdV. Mater. 14, 1857 (2002) http://dx.doi.org/10.1002/adma.20029002010.1002/adma.200290020Search in Google Scholar

[11] B.T. Qian, Z.Q. Shen, Langmuir 21, 9007 (2005) http://dx.doi.org/10.1021/la051308c10.1021/la051308cSearch in Google Scholar PubMed

[12] M.L. Ma, Y. Mao, M. Gupta, K.K. Gleason, G.C. Rutledge, Macromolecules 38, 9742 (2005) http://dx.doi.org/10.1021/ma051118910.1021/ma0511189Search in Google Scholar

[13] X. Zhang, F. Shi, X. Yu, H. Liu, Y. Fu, Z.Q. Wang, L. Jiang, X.Y. Li, J. Am. Chem. Soc. 126, 3064 (2004) http://dx.doi.org/10.1021/ja039872210.1021/ja0398722Search in Google Scholar PubMed

[14] F. Shi, X.X. Chen, L.Y. Wang, J. Niu, J.H. Yu, Z.Q. Wang, X. Zhang, Chem. Mater. 17, 6177 (2005) http://dx.doi.org/10.1021/cm051453b10.1021/cm051453bSearch in Google Scholar

[15] B. Xu, Z.S. Cai, Appl. Surf. Sci. 254, 5899 (2008) http://dx.doi.org/10.1016/j.apsusc.2008.03.16010.1016/j.apsusc.2008.03.160Search in Google Scholar

[16] J.P. Youngblood, T.J. McCarthy, Macromolecules 32, 6800 (1999) http://dx.doi.org/10.1021/ma990345610.1021/ma9903456Search in Google Scholar

[17] L. Zhai, F.Ç. Cebeci, R.E. Cohen, M.F. Rubner, Nano Lett. 4, 1349 (2004) http://dx.doi.org/10.1021/nl049463j10.1021/nl049463jSearch in Google Scholar

[18] X.Y. Ling, I.Y. Phang, G.J. Vancso, J. Huskens, D.N. Reinhoudt, Langmuir 25, 3260 (2009) http://dx.doi.org/10.1021/la804071510.1021/la8040715Search in Google Scholar PubMed

[19] T. Nishino, M. Meguro, K. Nakamae, M. Matsushita, Y. Ueda, Langmuir 15, 4321 (1999) http://dx.doi.org/10.1021/la981727s10.1021/la981727sSearch in Google Scholar

[20] H. Yabu, M. Takebayashi, M. Tanaka, M. Shimomura, Langmuir 21, 3235 (2005) http://dx.doi.org/10.1021/la050013w10.1021/la050013wSearch in Google Scholar PubMed

[21] J.Z. Gao, A.X. Wang, Y. Fu, J.L. Wu, D.P. Ma, X. Guo, Y. Li, W. Yang, Plasma Sci. Technol. 10, 30 (2008) http://dx.doi.org/10.1088/1009-0630/10/1/0710.1088/1009-0630/10/1/07Search in Google Scholar

[22] R. Joshi, R.D. Schulze, A.M. Plath, J.F. Friedrich, Plasma Proc. Polym. 5, 695 (2008) http://dx.doi.org/10.1002/ppap.20070017510.1002/ppap.200700175Search in Google Scholar

[23] M.B.O. Riekerink, J.G.A. Terlingen, G.H.M. Engbers, J. Feijen, Langmuir 15, 4847 (1999) http://dx.doi.org/10.1021/la990020i10.1021/la990020iSearch in Google Scholar

[24] D.S. Wavhal, E.R. Fisher, Langmuir 19, 79 (2003) http://dx.doi.org/10.1021/la020653o10.1021/la020653oSearch in Google Scholar

[25] A.B.D. Cassie, S. Baxter, Trans. Faraday Soc. 40, 546 (1944) http://dx.doi.org/10.1039/tf944400054610.1039/tf9444000546Search in Google Scholar

Published Online: 2012-9-21
Published in Print: 2012-12-1

© 2012 Versita Warsaw

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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