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BY-NC-ND 3.0 license Open Access Published by De Gruyter Open Access February 9, 2013

The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation

  • Kornelia Indykiewicz EMAIL logo , Marcin Hajłasz and Bogdan Paszkiewicz
From the journal Open Physics


This paper presents the methods of fabricating narrow parallel submicrometric stripes in silicon dioxide and a resist layer. The experiments were conducted by two techniques: double patterning lithography and double exposure lithography. In addition to the above mentioned processes, mask translation was applied. For all conducted experiments, chrome masks and a 405 nm line of the high pressure mercury lamp of an MA-56 Mask Aligner System were used. The main aim of the performed tests was to establish the utility and the possible applications of the methods used.

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Published Online: 2013-2-9
Published in Print: 2013-2-1

© 2013 Versita Warsaw

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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