Abstract
LaNi5 films were deposited on a nickel substrate using a La2Ni7 alloy target with a sputtering power, WS, of 50– 400 W at substrate temperature, TS, of 323–573 K by a radio frequency magnetron sputtering apparatus. The nickel content of the films decreased with increasing WS and increased with increasing TS. At low WS and low TS, amorphous films were deposited. In other conditions, the films were polycrystalline. The films deposited at high WS and low TS exhibited only a (hk · 0) peak in the X-ray diffraction profiles. This indicates that the c-axis of crystalline films was oriented parallel to the substrate plane. At high WS and high TS, the films with columnar structure were obtained. The hydrogen absorption capacity of the films increased with increasing WS. On the other hand, the equilibrium pressure of the films decreased with increasing WS. The films deposited at 400 W represented a pressure plateau on the pressure –composition isotherms.
References
1 Adachi, G.; Niki, K.; Shiokawa, J.: J. Less-Common Met. 81 (1981)345.10.1016/0022-5088(81)90040-0Search in Google Scholar
2 Adachi, G.; Niki, K.; Nagai, H.; Shiokawa, J.: J. Less-Common Met. 88 (1982) 213.10.1016/0022-5088(82)90033-9Search in Google Scholar
3 Sakaguchi, H.; Seri, H.; Adachi, G.: J. Phys. Chem. 94 (1990) 5313.10.1021/j100376a028Search in Google Scholar
4 Sakai, T. ; Ishikawa, H. ; Miyamura, H. ; Kuriyama, N. ; Yamada, S.; Iwasaki, T.: J. Electrochem. Soc. 138 (1991) 908.10.1149/1.2085746Search in Google Scholar
5 Uchida, H.; Ebisawa, T.; Denda, A.; Itoh, T.; Tsuzuki, S.: Z. Phys. Chem. N. F. 164 (1989) 1313.10.1524/zpch.1989.164.Part_2.1313Search in Google Scholar
6 Uchida, H.; Kojima, T.; Hashimoto, H.; Denda, A.: J. Less-Common Met. 172–174 (1991) 799.10.1016/0022-5088(91)90206-JSearch in Google Scholar
7 Ohtsuka, M.; Harada, K; Matsumoto, T; Itagaki, K., in: W. D. Cho, H. Y. Sohn (eds.), Value-Addition Metallurgy, TMS, Warrendale, PA (1998) 167.Search in Google Scholar
8 Nomura, K.; Ono, S.: J. Chem. Eng. Jpn. 49 (1985) 630.Search in Google Scholar
9 Japan Industrial Standard, H-7201 (1991) 1.Search in Google Scholar
10 Buschow, K.H.J.; Van Mal, H.H.: J. Less-Common Met. 29 (1972) 203.10.1016/0022-5088(72)90191-9Search in Google Scholar
© 2001 Carl Hanser Verlag, München