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Licensed Unlicensed Requires Authentication Published by De Gruyter January 13, 2022

Fabrication and Characterization of Hydrogen Absorption LaNi5 Alloy Films Sputtered on Nickel Substrate

  • Makoto Ohtsuka EMAIL logo , Yoshihiko Takeda , Tadayuki Kobayashi and Kimio Itagaki

Abstract

LaNi5 films were deposited on a nickel substrate using a La2Ni7 alloy target with a sputtering power, WS, of 50– 400 W at substrate temperature, TS, of 323–573 K by a radio frequency magnetron sputtering apparatus. The nickel content of the films decreased with increasing WS and increased with increasing TS. At low WS and low TS, amorphous films were deposited. In other conditions, the films were polycrystalline. The films deposited at high WS and low TS exhibited only a (hk · 0) peak in the X-ray diffraction profiles. This indicates that the c-axis of crystalline films was oriented parallel to the substrate plane. At high WS and high TS, the films with columnar structure were obtained. The hydrogen absorption capacity of the films increased with increasing WS. On the other hand, the equilibrium pressure of the films decreased with increasing WS. The films deposited at 400 W represented a pressure plateau on the pressure –composition isotherms.


Dr. M. Ohtsuka Institute of Multidisciplinary Research for Advanced Materials, Tohoku University 2-1-1, Katahira, Aoba-ku, Sendai 980–8577, Japan Fax: +81 22 217 5211

Dedicated to Professor Dr.-Ing. Dieter Neuschütz on the occasion of his 65th birthday


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Received: 2001-05-08
Published Online: 2022-01-13

© 2001 Carl Hanser Verlag, München

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