Published by De Gruyter

Volume 4 Issue 1 - Micro-optics for industrial applications / Guest Editors: Robert Brunner and Tasso R.M. Sales

Issue of Advanced Optical Technologies

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Contents
Journal Overview

Publicly Available February 6, 2015

Editorial

Publicly Available February 6, 2015

Reviewer recognition and new plans for 2015

Andreas Thoss, Michael Pfeffer

Page range: 1-3

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Views

Publicly Available February 6, 2015

European Photonics Industry Back to Growth in 2014

Arnold Mayer

Page range: 5-5

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Publicly Available February 6, 2015

Lenses for film and television: an international survey

Peter C. Slansky, Katrin Richthofer

Page range: 7-13

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Community

Publicly Available February 6, 2015

Community News

Page range: 15-17

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Publicly Available February 6, 2015

Topical issue: Micro-optics for industrial applications

Editorial

Publicly Available February 6, 2015

Micro-optics for industrial applications

Robert Brunner

Page range: 23-24

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Tutorial

February 6, 2015

High-end spectroscopic diffraction gratings: design and manufacturing

Tilman Glaser

Page range: 25-46

Abstract

Diffraction gratings are key components for spectroscopic systems. For high-end applications, they have to meet advanced requirements as, e.g., maximum efficiency, lowest possible scattered light level, high numerical aperture, and minimal aberrations. Diffraction gratings are demanded to allow spectrometer designs with highest resolution, a maximal étendue, and minimal stray light, built within a minimal volume. This tutorial is intended to provide an overview of different high-end spectroscopic gratings, their theoretical design and manufacturing technologies.

Review Articles

Publicly Available February 6, 2015

From regular periodic micro-lens arrays to randomized continuous phase profiles

Matthias Cumme, Arnaud Deparnay

Page range: 47-61

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Abstract

Illumination systems for various industrial applications, e.g., in semiconductor industries and medical treatment techniques, require a specific and well-adapted intensity distribution with maximum efficiency, best achievable accuracy, and highest flexibility in the selection of the target light field. Additionally, for particular applications, all these aspects have to be fulfilled simultaneously for different wavelengths. In most of these situations, the challenging optical specifications are accompanied by the requirement of a cost-efficient fabrication technique, suitable at least for batch or small series production. In the present contribution, we first retrace the development steps and performance progress of micro-optical-based beam shaping setups. Secondly, we discuss the possibilities resulting from a combination of both refractive and diffractive optical characteristics. Especially, we show that a well-adapted combination of refractive and diffractive properties in a single element allows us to create achromatic diffusers with exceptional flexibility and high conversion efficiency.

February 6, 2015

Micro-optics and lithography simulation are key enabling technologies for shadow printing lithography in mask aligners

Reinhard Voelkel, Uwe Vogler, Arianna Bramati, Wilfried Noell

Page range: 63-69

Abstract

Mask aligners are lithographic tools used to transfer a pattern of microstructures by shadow printing lithography onto a planar wafer. Contact lithography allows us to print large mask fields with sub-micron resolution, but requires frequent mask cleaning. Thus, contact lithography is used for small series of wafer production. Proximity lithography, where the mask is located at a distance of typically 30–100 μm above the wafer, provides a resolution of approximately 3–5 μm, limited by diffraction effects. Proximity lithography in mask aligners is a very cost-efficient method widely used in semiconductor, packaging and MEMS manufacturing industry for high-volume production. Micro-optics plays a key role in improving the performance of shadow printing lithography in mask aligners. Refractive or diffractive micro-optics allows us to efficiently collect the light from the light source and to precisely shape the illumination light (customized illumination). Optical proximity correction and phase shift mask technology allow us to influence the diffraction effects in the aerial image and to enhance resolution and critical dimension. The paper describes the status and future trends of shadow printing lithography in mask aligners and the decisive role of micro-optics as key enabling technology.

Research Articles

January 15, 2015

Polarizing and angle-sensitive color filter in transmittance for security feature applications

Hans Lochbihler

Page range: 71-77

Abstract

Subwavelength gratings comprising a stack of two thin metallic wire gratings embedded in a dielectric exhibit distinctive color properties in transmittance. Its angle-dependent coloring can be easily noticed by human observers in ambient light. Moreover, it has pronounced polarizing properties in the visible wavelength range. The optical properties of these gratings have been numerically studied. The results have been confirmed by manufactured samples replicated by a simple nanoimprint process on plastic foils. The manufacturing process is predestined for industrial mass production. Applications as authentication devices are given.

January 15, 2015

Micro-optics in lighting applications

Wolfgang Mönch

Page range: 79-85

Abstract

The intention of this article is to give a concise overview on current applications of micro-optical components in lighting, including general lighting, automotive lighting, projection, and display backlighting. Regarding the light sources, the focus of this paper is on inorganic light-emitting diodes (LEDs) and the characteristic problems encountered with them. Lasers, laser diodes, and organic light-emitting diodes (OLEDs) are out of scope of this paper. Micro-optical components for current applications of inorganic LEDs may be categorized essentially into three classes: First, components for light shaping, i.e., adjusting the intensity distribution to a desired target; second, components for light homogenization with respect to space and color, and third, large-area micro-optical elements. These large-area elements comprise micro-optical slabs and sheets for guiding, reflection, and refraction of light and are designed without regard to particular details of type, design, arrangement, and layout of the individual light emitters. References are given to textbooks and review articles to guide the interested reader to further and more detailed studies on the problems discussed here.

Letter

January 20, 2015

Optical simulation of microstructured surfaces

Donald J. Schertler, Paul O. McLaughlin

Page range: 87-91

Abstract

We present techniques and results of optical simulations of microstructured surfaces using BSDF measurements.

Tutorial

February 6, 2015

The consequences of Petzval correction in lithographic designs

David Shafer

Page range: 93-97

Abstract

Several design examples show how correcting Petzval curvature in high NA lithographic designs leads to much of the design complexity. There are two cases in which much simpler designs are possible, neither of them practical with today’s technology. One is that of a curved object and/or image system, where no attempt at all is made to control Petzval curvature. The other case is where a diffractive surface is used in the design, which allows Petzval to be easily corrected in relatively simple designs. A very simple 1.1 NA all-refractive immersion design is shown that uses one diffractive surface.

Research Article

February 6, 2015

Methods for describing illumination colour uniformities

Ingo Rotscholl, Klaus Trampert, Franziska Herrmann, Cornelius Neumann

Page range: 99-110

Abstract

Optimizing angular or spatial colour homogeneity has become an important task in many general lighting applications and first requires a valid description of illumination colour homogeneity. We analyse different frequently used methods to describe colour distributions in theory and with measurement data. It is described why information about chromaticity coordinates, correlated colour temperature and global chromaticity coordinate distances are not sufficient for describing colour homogeneity perception of light distributions. We present local chromaticity coordinate distances as expandable and easy implementable method for describing colour homogeneity distributions that is adaptable to the field of view by only one intuitive, physiological meaningful parameter.

About this journal

Objective

Advanced Optical Technologies is a strictly peer-reviewed scientific journal. The major aim of Advanced Optical Technologies is to publish recent progress in the fields of optical design, optical engineering, and optical manufacturing. Advanced Optical Technologies has a main focus on applied research and addresses scientists as well as experts in industrial research and development.

Advanced Optical Technologies partners with the European Optical Society (EOS). All its 4.500+ members have free online access to the journal through their EOS member account.

Topics

Optical design
Lithography
Opto-mechanical engineering
Illumination and lighting technology
Precision fabrication
Image sensor devices
Optical materials (polymer based, inorganic, crystalline/amorphous)
Optical instruments in life science (biology, medicine, laboratories)
Optical metrology
Optics in aerospace/defense
Simulation, interdisciplinary
Optics for astronomy
Standards
Consumer optics
Optical coatings

Article formats
Tutorial, Review Article, Research Article, Letter, Short Communication, Views

> Information on submission process

Volume 4 Issue 1 - Micro-optics for industrial applications / Guest Editors: Robert Brunner and Tasso R.M. Sales

Issue of Advanced Optical Technologies

Cover and Frontmatter

Reviewer recognition and new plans for 2015

European Photonics Industry Back to Growth in 2014

Lenses for film and television: an international survey

Community News

Conference Calendar

Editorial

Micro-optics for industrial applications

Tutorial

High-end spectroscopic diffraction gratings: design and manufacturing

Abstract

Review Articles

From regular periodic micro-lens arrays to randomized continuous phase profiles

Abstract

Micro-optics and lithography simulation are key enabling technologies for shadow printing lithography in mask aligners

Abstract

Research Articles

Polarizing and angle-sensitive color filter in transmittance for security feature applications

Abstract

Micro-optics in lighting applications

Abstract

Letter

Optical simulation of microstructured surfaces

Abstract

The consequences of Petzval correction in lithographic designs

Abstract

Methods for describing illumination colour uniformities

Abstract