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Advanced Optical Technologies

Editor-in-Chief: Pfeffer, Michael


CiteScore 2018: 1.42

SCImago Journal Rank (SJR) 2018: 0.499
Source Normalized Impact per Paper (SNIP) 2018: 1.346

In co-publication with THOSS Media GmbH

Online
ISSN
2192-8584
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Volume 4, Issue 1

Issues

The consequences of Petzval correction in lithographic designs

David Shafer
Published Online: 2015-02-06 | DOI: https://doi.org/10.1515/aot-2014-0067

Abstract

Several design examples show how correcting Petzval curvature in high NA lithographic designs leads to much of the design complexity. There are two cases in which much simpler designs are possible, neither of them practical with today’s technology. One is that of a curved object and/or image system, where no attempt at all is made to control Petzval curvature. The other case is where a diffractive surface is used in the design, which allows Petzval to be easily corrected in relatively simple designs. A very simple 1.1 NA all-refractive immersion design is shown that uses one diffractive surface.

Keywords: all-refractive immersion design; diffractive surface; high NA lithographic designs

References

About the article

David Shafer

David Shafer has headed David Shafer Optical Design, in Fairfield, CT, since 1980. Prior to that, he spent 15 years at Itek Corp., Honeywell Electro-Optics Center, and Perkin-Elmer Corp. Much of his design work has been in lithographic systems and semiconductor inspection systems. He attended the Institute of Optics at the University of Rochester from 1961 to 1966. He has published extensively and has over 125 patents.


Corresponding author: David Shafer, Optical Design, Fairfield, CT, USA, e-mail:


Received: 2014-12-15

Accepted: 2015-01-12

Published Online: 2015-02-06

Published in Print: 2015-02-01


Citation Information: Advanced Optical Technologies, Volume 4, Issue 1, Pages 93–97, ISSN (Online) 2192-8584, ISSN (Print) 2192-8576, DOI: https://doi.org/10.1515/aot-2014-0067.

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