Jump to ContentJump to Main Navigation
Show Summary Details
More options …

Advanced Optical Technologies

Editor-in-Chief: Pfeffer, Michael


CiteScore 2018: 1.42

SCImago Journal Rank (SJR) 2018: 0.499
Source Normalized Impact per Paper (SNIP) 2018: 1.346

In co-publication with THOSS Media GmbH

Online
ISSN
2192-8584
See all formats and pricing
More options …
Volume 5, Issue 3

Issues

Ray selection for optimization of rotationally symmetric systems

Greg W. Forbes / Johannes Ruoff / Andreas Flesch / Norbert Kerwien
Published Online: 2016-05-16 | DOI: https://doi.org/10.1515/aot-2016-0019

Abstract

Efficient performance assessment is essential during the design of systems involving complex aspheres. We present new classes of pupil sampling schemes that, with a reduced number of rays, yield accurate estimates of the RMS wavefront aberration over a circular pupil. It turns out that the number of samples in the pupil can be reduced by a factor of about 0.7, and these ideas can also be expected to lead to a similar additional reduction factor when averaging over the field and color. Beyond that, analysis of a patented lens system is used to establish the path to further significant reductions.

Keywords: aspheres; cubature; optical design; optimization

References

About the article

Greg W. Forbes

Greg W. Forbes is an Adjunct Professor in Physics at Macquarie University (Sydney) and the Director of Scisense Consulting Pty Ltd. Following his PhD in Theoretical Physics at the Australian National University, he was a Fulbright Fellow at the Optical Sciences Center (Tucson), a tenured faculty member of The Institute of Optics (Rochester, 1985–1994), a Research Professor at Macquarie University (Sydney, 1994–2000), and a Senior Scientist at QED Technologies (2000–2015). Throughout his career, optical modeling has remained one of his primary interests.

Johannes Ruoff

Johannes Ruoff is a Senior Optical Designer at Carl Zeiss SMT GmbH. He holds a PhD in Physics from the University of Tübingen, Germany. His research interests are in EUV optics, high-NA imaging, electromagnetic diffraction theory, and polarization aspects in lithography.

Andreas Flesch

Andreas Flesch is a staff member at the Corporate Research and Technology department at ZEISS in Oberkochen since 2013. His main research interests include optimization algorithms, mathematical surface descriptions, novel ray-based approaches for optical system modeling, and the efficient implementation of these methods in optical design software. He holds a PhD in Theoretical Physics from RWTH Aachen University, Germany.

Norbert Kerwien

Norbert Kerwien is the Director of the Optics Concepts group at Corporate Research and Technology of ZEISS. After his PhD on Polarization Effects in Microscopic Image Formation at the Institute of Applied Optics, University of Stuttgart, he joined the lithography division of ZEISS in 2006. Since 2010, he works at Corporate Research and Technology. Among his primary interests are physical optical image formation, computational imaging, and optical design.


Received: 2016-03-24

Accepted: 2016-04-21

Published Online: 2016-05-16

Published in Print: 2016-06-01


Citation Information: Advanced Optical Technologies, Volume 5, Issue 3, Pages 237–247, ISSN (Online) 2192-8584, ISSN (Print) 2192-8576, DOI: https://doi.org/10.1515/aot-2016-0019.

Export Citation

©2016 THOSS Media & De Gruyter.Get Permission

Citing Articles

Here you can find all Crossref-listed publications in which this article is cited. If you would like to receive automatic email messages as soon as this article is cited in other publications, simply activate the “Citation Alert” on the top of this page.

[1]
Gregory W. Forbes and Johannes Ruoff
Optical Engineering, 2018, Volume 57, Number 10, Page 1

Comments (0)

Please log in or register to comment.
Log in