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Advanced Optical Technologies

Editor-in-Chief: Pfeffer, Michael


CiteScore 2018: 1.42

SCImago Journal Rank (SJR) 2018: 0.499
Source Normalized Impact per Paper (SNIP) 2018: 1.346

In co-publication with THOSS Media GmbH

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2192-8584
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Volume 6, Issue 3-4

Issues

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling

Igor Fomenkov / David Brandt / Alex Ershov / Alexander Schafgans / Yezheng Tao / Georgiy Vaschenko / Slava Rokitski / Michael Kats / Michael Vargas / Michael Purvis / Rob Rafac / Bruno La Fontaine / Silvia De Dea / Andrew LaForge / Jayson Stewart / Steven Chang / Matthew Graham / Daniel Riggs / Ted Taylor / Mathew Abraham / Daniel Brown
Published Online: 2017-06-08 | DOI: https://doi.org/10.1515/aot-2017-0029

Abstract

Extreme ultraviolet (EUV) lithography is expected to succeed in 193-nm immersion multi-patterning technology for sub-10-nm critical layer patterning. In order to be successful, EUV lithography has to demonstrate that it can satisfy the industry requirements in the following critical areas: power, dose stability, etendue, spectral content, and lifetime. Currently, development of second-generation laser-produced plasma (LPP) light sources for the ASML’s NXE:3300B EUV scanner is complete, and first units are installed and operational at chipmaker customers. We describe different aspects and performance characteristics of the sources, dose stability results, power scaling, and availability data for EUV sources and also report new development results.

Keywords: EUV; laser-produced plasma; lithography; 13.5 nm; power; sources

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About the article

Igor Fomenkov

Igor Fomenkov is an ASML Fellow in Technology Development Group in San Diego, California. After completing a PhD in Physics and Mathematics at Moscow Institute of Physics and Technology (MPTI) in 1986, he joined General Physics Institute as a senior scientist, where he worked in the field of interaction of high intensity laser radiation with matter and diagnostics of laser produced plasma. He joined Cymer in 1992 and worked on the development of high power, high reliability KrF and ArF Excimer lasers for DUV (at 248 nm and 193 nm) microlithography. Since 1997 he has been conducting research and development of sources for Extreme Ultraviolet Lithography at 13.5 nm. Over several years of research on EUV light generation, based on Discharge Produced Plasma and Laser Produced Plasma, he has been involved in defining the source architecture, namely Laser Produced Plasma EUV source using high power, high repetition rate CO2 laser and tin droplets as source target material and development of the source for High Volume Manufacturing. He was appointed Cymer Fellow in 2003 and ASML Fellow in 2014. He has authored over 50 technical papers in the field of Laser Produced Plasma, DUV lasers and sources for EUV lithography, and holds over 100 patents in the areas of DUV and EUV light sources.

Alexander Schafgans

Alexander Schafgans is a principal scientist at Cymer/ASML, the global leader in developing light sources used by the semiconductor industry to pattern advanced logic and memory. In his role at Cymer, Schafgans has been focused on leading EUV power scaling activities from 10 W through 500 W. During his PhD in Physics, Schafgans focused on the infrared and optical properties of correlated electron materials and graduated from UC San Diego in 2011.

Slava Rokitski

Slava Rokitski is a Senior Manager of System Design at Cymer, an ASML company. He received a PhD degree in electrical engineering at the University of California, San Diego, where he performed research on real-time ultrafast optical information processing and detection. At Cymer Slava has been developing technologies for 193 nm and 248 nm high power excimer laser systems for DUV lithography. Most recently Slava has been developing technologies for high power CO2 master-oscillator-power-amplifier laser systems, used in laser produced plasma extreme ultraviolet light sources.

Michael Purvis

Michael Purvis serves as the Systems Power Architect for the EUV Source Program at ASML San Diego. Over the last decade, Michael has published in the field of laser created plasmas. His initial investigations at Colorado State University included developing discharge and laser produced EUV lasers for applications in plasma diagnostics, after which he worked on theoretical plasma modelling and high energy density experiments at CSU, Lawrence Livermore National Labs and SLAC. He is now applying his experience with plasmas generated in the femtosecond to nanosecond time scales towards the development of EUV light sources at ASML.

Silvia De Dea

Silvia De Dea received her PhD in Chemical Engineering from The University of California, San Diego in 2008. Her research interests include novel nanomaterials and analytical instruments, materials development for extreme conditions and EUV light technology. She has been with Cymer (now ASML) since 2008 focusing on technology development of EUV sources for semiconductor lithography. She is a Principal Scientist with ASML working on EUV optics lifetime and materials performance.

Jayson Stewart

Jayson Stewart received his PhD in Physics from the University of Colorado in 2009. His research interests focus on light-matter interactions and EUV light source development. In 2012, Jayson joined the ASML team as a research scientist to work on the EUV light source within the technology development group. His work focuses on managing the debris resulting from the laser produced plasma.

Matthew Graham

Matthew Graham received his PhD in Mechanical Engineering from University of California San Diego in 2007. In 2008 he joined Cymer/ASML working on the DUV light source control system and in 2009 transitioned to development of the EUV light sources for semiconductor lithography. He is currently a Staff Engineer working on control systems around the plasma generation process in the EUV light source.

Daniel Riggs

Daniel J. Riggs has a BS in Mechanical Engineering, a BA in Mathematics: Applied Science, and an MS and PhD in Engineering Science, all from the University of California, San Diego (UCSD). He has worked as a control systems engineer at Cymer since 2006. For the first several years, his focus was high performance control system development for Cymer’s DUV laser products. Since 2009, his focus has been EUV system and control system architecture and design.

Daniel Brown

Daniel Brown currently serves as Vice President of Technology Development for ASML San Diego. In this role since 2010, he previously held the positions of Vice President, Technology Development and Vice President, Engineering within the Deep-Ultraviolet Product Group in Cymer, Inc. In his current role, he is chartered with overseeing the technology activities for the company’s EUV light source development and deep-ultraviolet light source products to meet the demands of the semiconductor marketplace. Prior to joining Cymer in 2000, Brown a served for over 11 years in various Australian Research Council Fellow positions at Macquarie University (located in Sydney, Australia) including Australian Senior Research Fellow and Australian Research Fellow, responsible for development of novel high-power ultraviolet laser sources based on nonlinear frequency conversion of high-pulse-rate laser systems. Dr. Brown holds a Doctorate degree in physics and a Bachelor’s degree in science from the University of New England in Australia.


Received: 2017-04-10

Accepted: 2017-05-10

Published Online: 2017-06-08

Published in Print: 2017-06-27


Citation Information: Advanced Optical Technologies, Volume 6, Issue 3-4, Pages 173–186, ISSN (Online) 2192-8584, ISSN (Print) 2192-8576, DOI: https://doi.org/10.1515/aot-2017-0029.

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