Jump to ContentJump to Main Navigation
Show Summary Details
More options …

Advanced Optical Technologies

Editor-in-Chief: Pfeffer, Michael

CiteScore 2018: 1.42

SCImago Journal Rank (SJR) 2018: 0.499
Source Normalized Impact per Paper (SNIP) 2018: 1.346

In co-publication with THOSS Media GmbH

See all formats and pricing
More options …
Volume 6, Issue 6


Coherent diffractive imaging methods for semiconductor manufacturing

Patrick Helfenstein / Iacopo Mochi / Rajendran Rajeev / Sara Fernandez / Yasin Ekinci
Published Online: 2017-12-04 | DOI: https://doi.org/10.1515/aot-2017-0052


The paradigm shift of the semiconductor industry moving from deep ultraviolet to extreme ultraviolet lithography (EUVL) brought about new challenges in the fabrication of illumination and projection optics, which constitute one of the core sources of cost of ownership for many of the metrology tools needed in the lithography process. For this reason, lensless imaging techniques based on coherent diffractive imaging started to raise interest in the EUVL community. This paper presents an overview of currently on-going research endeavors that use a number of methods based on lensless imaging with coherent light.

Keywords: actinic inspection; coherent diffractive imaging; extreme ultraviolet (EUV); lensless imaging; mask inspection; ptychography; wafer inspection


  • [1]

    K. A. Goldberg and I. Mochi, J. Vac. Sci. Technol. B Nanotechnol. Microelectron. 28, C6E1–C6E10 (2010).Google Scholar

  • [2]

    I. Mochi, V. Philipsen, E. Gallagher, E. Hendrickx, K. Lyakhova, et al., Proc. SPIE 9776, 97761S (2016).CrossrefGoogle Scholar

  • [3]

    J. Miao, T. Ishikawa, I. Robinson and M. Murnane, Science 348, 530–535 (2015).CrossrefGoogle Scholar

  • [4]

    R. Gerchberg and W. Saxton, Optik 35, 237–246 (1972).Google Scholar

  • [5]

    J. R. Fienup, Opt. Lett. 3, 27–29 (1978).CrossrefGoogle Scholar

  • [6]

    J. Miao, P. Charalambous, J. Kirz and D. Sayre, Nature 400, 342–344 (1999).CrossrefGoogle Scholar

  • [7]

    D. Gardner, M. Tanksalvala, E. Shanblatt, X. Zhang, B. Galloway, et al., Nat. Photonics 11, 259–263 (2017).CrossrefGoogle Scholar

  • [8]

    P. Thibault, M. Dierolf, A. Menzel, O. Bunk, C. David, et al., Science 321, 379–382 (2008).CrossrefGoogle Scholar

  • [9]

    A. Maiden and J. Rodenburg, Ultramicroscopy 109, 1256–1262 (2009).CrossrefGoogle Scholar

  • [10]

    I. Mochi, K. A. Goldberg and S. Huh, J. Vac. Sci. Technol. B 28, C6E11–C6E16 (2010).Google Scholar

  • [11]

    T. Harada, H. Hashimoto, T. Amano, H. Kinoshita and T. Watanabe, J. Micro Nanolithogr. MEMS MOEMS 15, 021007 (2016).CrossrefGoogle Scholar

  • [12]

    A. Maryasov, S. Herbert, L. Juschkin, R. Lebert and K. Bergmann, Proc. SPIE 7985, 79850C–79850C–8 (2011).Google Scholar

  • [13]

    L. Bahrenberg, S. Herbert, J. Tempeler, A. Maryasov, O. Hofmann, et al., Proc. SPIE 9422, 942229–942229–9 (2015).Google Scholar

  • [14]

    R. Jonckheere, D. Van den Heuvel, N. Takagi, H. Watanabe and E. Gallagher, Proc. SPIE 9422, 942216–942216–10 (2015).Google Scholar

  • [15]

    N. Takagi, H. Watanabe, D. Van den Heuvel, R. Jonckheere and E. Gallagher, Proc. SPIE 9658, 96580F–96580F–6 (2015).Google Scholar

  • [16]

    P. Mangat, E. Verduijn, O. R. Wood, M. P. Benk, A. Wojdyla, et al., Proc. SPIE 9658, 96580E–96580E–8 (2015).Google Scholar

  • [17]

    T. Harada, J. Kishimoto, T. Watanabe, H. Kinoshita and D. G. Lee, J. Vac. Sci. Technol. B 27, 3203–3207 (2009).CrossrefGoogle Scholar

  • [18]

    M. Nakasuji, A. Tokimasa, T. Harada, Y. Nagata, T, Watanabe, et al., Jpn. J. Appl. Phys. 51(6S), 06FB09 (2012).CrossrefGoogle Scholar

  • [19]

    T. Fujino, Y. Tanaka, T. Harada, Y. Nagata, T. Watanabe, et al., Jpn. J. Appl. Phys. 54(6S1), 06FC01 (2015).CrossrefGoogle Scholar

  • [20]

    J. Bußmann, M. Odstrčil, R. Bresenitz, D. Rudolf, J. Miao, et al., Proc. SPIE 9589, 95890L–95890L–8 (2015).Google Scholar

  • [21]

    I. Mohacsi, P. Helfenstein, R. Rajendran, and Y. Ekinci. Proc. SPIE 9778, 97781O (2016).CrossrefGoogle Scholar

  • [22]

    Y. Ekinci, P. Helfenstein, R. Rajeev, I. Mochi, I. Mohacsi, et al., Proc. SPIE 9985, 99851P–99851P–9 (2016).Google Scholar

  • [23]

    P. Helfenstein, I. Mochi, R. Rajendran, S. Yoshitake and Y. Ekinci, Proc. SPIE 10143, 101431Q–101431Q–7 (2017).Google Scholar

  • [24]

    I. Mochi, P. Helfenstein, I. Mohacsi, R. Rajeev, D. Kazazis, et al., J. Micro Nanolithogr. MEMS MOEMS 16, 041003 (2017).CrossrefGoogle Scholar

  • [25]

    R. Rajendran, I. Mochi, P. Helfenstein, I. Mohacsi, S. Redford, et al., Proc. SPIE 10145, 101450N–101450N–12 (2017).Google Scholar

  • [26]

    M. Guizar-Sicairos, S. T. Thurman and J. R. Fienup, Opt. Lett. 33, 156–158 (2008).CrossrefGoogle Scholar

  • [27]

    T. Harada, M. Nakasuji, Y. Nagata, T. Watanabe and H. Kinoshita, Jpn. J. Appl. Phys. 52(6S), 06GB02 (2013).CrossrefGoogle Scholar

  • [28]

    D. Mamezaki, T. Harada, Y. Nagata and T. Watanabe, Jpn. J. Appl. Phys. 56(6S1), 06GB01 (2017).CrossrefGoogle Scholar

  • [29]

    M. Odstrčil, J. Bußmann, D. Rudolf, R. Bresenitz, J. Miao, et al., Opt. Lett. 40, 5574–5577 (2015).CrossrefGoogle Scholar

  • [30]

    P. Helfenstein, I. Mohacsi, R. Rajeev and Y. Ekinci, J. Micro Nanolithogr. MEMS MOEMS 15, 034006 (2016).CrossrefGoogle Scholar

  • [31]

    M. Odstrčil, P. Baksh, S. A. Boden, R. Card, J. E. Chad, et al., Opt. Express 24, 8360–8369 (2016).CrossrefGoogle Scholar

  • [32]

    P. Thibault and A. Menzel, Nature 494, 68–71 (2013).CrossrefGoogle Scholar

  • [33]

    M. Dierolf, A. Menzel, P. Thibault, P. Schneider, C. M. Kewish, et al., Nature 467(7314), 436–439 (2010).CrossrefGoogle Scholar

  • [34]

    M. Holler, M. Guizar-Sicairos, E. H. Tsai, R. Dinapoli, E. Muller, et al., Nature 543, 402–406 (2017).CrossrefGoogle Scholar

  • [35]

    M. D. Seaberg, B. Zhang, D. F. Gardner, E. R. Shanblatt, M. M. Murnane, et al., Optica 1, 39–44 (2014).CrossrefGoogle Scholar

  • [36]

    M. D. Seaberg, D. E. Adams, E. L. Townsend, D. A. Raymondson, W. F. Schlotter, et al., Opt. Express 19, 22470–22479 (2011).CrossrefGoogle Scholar

  • [37]

    S. Witte, V. T. Tenner, D. W. E. Noom and K. S. E. Eikema, Light Sci. Appl. 3, e163 (2014).CrossrefGoogle Scholar

  • [38]

    A. Mozzanica, A. Bergamaschi, S. Cartier, R. Dinapoli, D, Greiffenberg, et al., J. Instrum. 9, C05010 (2014).CrossrefGoogle Scholar

  • [39]

    X. Huang, K. Lauer, J. N. Clark, W. Xu, E. Nazaretski, et al., Sci. Rep. 5, 9074 (2015).CrossrefGoogle Scholar

About the article

Received: 2017-08-09

Accepted: 2017-09-21

Published Online: 2017-12-04

Published in Print: 2017-12-20

Citation Information: Advanced Optical Technologies, Volume 6, Issue 6, Pages 439–448, ISSN (Online) 2192-8584, ISSN (Print) 2192-8576, DOI: https://doi.org/10.1515/aot-2017-0052.

Export Citation

©2017 THOSS Media & De Gruyter, Berlin/Boston.Get Permission

Citing Articles

Here you can find all Crossref-listed publications in which this article is cited. If you would like to receive automatic email messages as soon as this article is cited in other publications, simply activate the “Citation Alert” on the top of this page.

Priya Dwivedi, Silvania F. Pereira, and H. Paul Urbach
Optical Engineering, 2019, Volume 58, Number 04, Page 1

Comments (0)

Please log in or register to comment.
Log in