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Advanced Optical Technologies

Editor-in-Chief: Pfeffer, Michael


CiteScore 2018: 1.42

SCImago Journal Rank (SJR) 2018: 0.499
Source Normalized Impact per Paper (SNIP) 2018: 1.346

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Volume 6, Issue 6

Issues

Coherent diffractive imaging methods for semiconductor manufacturing

Patrick Helfenstein / Iacopo Mochi / Rajendran Rajeev / Sara Fernandez / Yasin Ekinci
Published Online: 2017-12-04 | DOI: https://doi.org/10.1515/aot-2017-0052

Abstract

The paradigm shift of the semiconductor industry moving from deep ultraviolet to extreme ultraviolet lithography (EUVL) brought about new challenges in the fabrication of illumination and projection optics, which constitute one of the core sources of cost of ownership for many of the metrology tools needed in the lithography process. For this reason, lensless imaging techniques based on coherent diffractive imaging started to raise interest in the EUVL community. This paper presents an overview of currently on-going research endeavors that use a number of methods based on lensless imaging with coherent light.

Keywords: actinic inspection; coherent diffractive imaging; extreme ultraviolet (EUV); lensless imaging; mask inspection; ptychography; wafer inspection

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About the article

Received: 2017-08-09

Accepted: 2017-09-21

Published Online: 2017-12-04

Published in Print: 2017-12-20


Citation Information: Advanced Optical Technologies, Volume 6, Issue 6, Pages 439–448, ISSN (Online) 2192-8584, ISSN (Print) 2192-8576, DOI: https://doi.org/10.1515/aot-2017-0052.

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