Jump to ContentJump to Main Navigation
Show Summary Details
More options …

Current Directions in Biomedical Engineering

Joint Journal of the German Society for Biomedical Engineering in VDE and the Austrian and Swiss Societies for Biomedical Engineering

Editor-in-Chief: Dössel, Olaf

Editorial Board: Augat, Peter / Buzug, Thorsten M. / Haueisen, Jens / Jockenhoevel, Stefan / Knaup-Gregori, Petra / Kraft, Marc / Lenarz, Thomas / Leonhardt, Steffen / Malberg, Hagen / Penzel, Thomas / Plank, Gernot / Radermacher, Klaus M. / Schkommodau, Erik / Stieglitz, Thomas / Urban, Gerald A.


CiteScore 2018: 0.47

Source Normalized Impact per Paper (SNIP) 2018: 0.377

Open Access
Online
ISSN
2364-5504
See all formats and pricing
More options …

Fabrication and electrochemical characterization of ruthenium nanoelectrodes

Sonja Allani
  • Corresponding author
  • Fraunhofer Institute for Microelectronic Circuits and Systems IMS, Finkenstr. 61, 47057 Duisburg, Germany
  • Email
  • Other articles by this author:
  • De Gruyter OnlineGoogle Scholar
/ Andreas Jupe
  • Fraunhofer Institute for Microelectronic Circuits and Systems IMS, Finkenstr. 61, 47057 Duisburg, Germany
  • Other articles by this author:
  • De Gruyter OnlineGoogle Scholar
/ Martin Figge
  • Fraunhofer Institute for Microelectronic Circuits and Systems IMS, Finkenstr. 61, 47057 Duisburg, Germany
  • Other articles by this author:
  • De Gruyter OnlineGoogle Scholar
/ Andreas Goehlich
  • Fraunhofer Institute for Microelectronic Circuits and Systems IMS, Finkenstr. 61, 47057 Duisburg, Germany
  • Other articles by this author:
  • De Gruyter OnlineGoogle Scholar
/ Holger Vogt
  • Fraunhofer Institute for Microelectronic Circuits and Systems IMS, Finkenstr. 61, 47057 Duisburg, Germany
  • Other articles by this author:
  • De Gruyter OnlineGoogle Scholar
Published Online: 2017-09-07 | DOI: https://doi.org/10.1515/cdbme-2017-0082

Abstract

The Fraunhofer IMS has recently developed a technique for producing nanoelectrodes that are generated by atomic layer deposition (ALD) in a via deep reactive ion etching (DRIE) structured sacrificial layer. This method enables the fabrication of CMOS- and biocompatible nanoelectrodes with suitable ALD-materials. Improvements of the established fabrication processes and the electrochemical characterization of such electrodes are presented. In the frame of the Fraunhofer-Max-Planckcooperation project ZellMOS different types of nanoelectrodes are studied. Their diameter is in the range of 200 nm and thereby sufficiently small to be taken up by living cells. In addition, the electrodes are mechanically enforced by an oxide layer at the nanoelectrodes’ bottom.

Keywords: nanoelectrodes; intracellular recording; electrochemical characterization; atomic layer deposition; deep reactive ion etching

About the article

Published Online: 2017-09-07


Citation Information: Current Directions in Biomedical Engineering, Volume 3, Issue 2, Pages 393–396, ISSN (Online) 2364-5504, DOI: https://doi.org/10.1515/cdbme-2017-0082.

Export Citation

©2017 Sonja Allani et al., published by De Gruyter. This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License. BY-NC-ND 4.0

Comments (0)

Please log in or register to comment.
Log in