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High Temperature Materials and Processes

Editor-in-Chief: Fukuyama, Hiroyuki

Editorial Board: Waseda, Yoshio / Fecht, Hans-Jörg / Reddy, Ramana G. / Manna, Indranil / Nakajima, Hideo / Nakamura, Takashi / Okabe, Toru / Ostrovski, Oleg / Pericleous, Koulis / Seetharaman, Seshadri / Straumal, Boris / Suzuki, Shigeru / Tanaka, Toshihiro / Terzieff, Peter / Uda, Satoshi / Urban, Knut / Baron, Michel / Besterci, Michael / Byakova, Alexandra V. / Gao, Wei / Glaeser, Andreas / Gzesik, Z. / Hosson, Jeff / Masanori, Iwase / Jacob, Kallarackel Thomas / Kipouros, Georges / Kuznezov, Fedor


IMPACT FACTOR 2018: 0.427
5-year IMPACT FACTOR: 0.471

CiteScore 2018: 0.58

SCImago Journal Rank (SJR) 2018: 0.231
Source Normalized Impact per Paper (SNIP) 2018: 0.377

Open Access
Online
ISSN
2191-0324
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Volume 18, Issue 1-2

Issues

Structural Study of Thin Amorphous SiO2 and Si3N4 Films by the Grazing Incidence X-Ray Scattering (GIXS) Method

Shigeo Sato, / Ryoji Kakiuchi, / Masato Yoshiya, / Eiichiro Matsubara, / Masatoshi Saito, / Yoshio Waseda, / Shinji Takayama,
Published Online: 2011-07-13 | DOI: https://doi.org/10.1515/HTMP.1999.18.1-2.99

About the article

Published Online: 2011-07-13

Published in Print: 1999-01-01


Citation Information: High Temperature Materials and Processes, Volume 18, Issue 1-2, Pages 99–107, ISSN (Online) 2191-0324, ISSN (Print) 0334-6455, DOI: https://doi.org/10.1515/HTMP.1999.18.1-2.99.

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