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International Journal of Chemical Reactor Engineering

Ed. by de Lasa, Hugo / Xu, Charles Chunbao

6 Issues per year

IMPACT FACTOR 2016: 0.623
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CiteScore 2016: 0.58

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Modeling of Chemical Vapor Deposition in a Fluidized Bed Reactor Based on Discrete Particle Simulation

Gregor Czok
  • 1Hamburg University of Technology,
/ Mao Ye
  • 2University of Twente, Enschede, The Netherlands,
/ J. A. M. Hans Kuipers
  • 3University of Twente, Enschede, The Netherlands,
/ Joachim Werther
  • 4Hamburg University of Technology,
Published Online: 2005-12-28 | DOI: https://doi.org/10.2202/1542-6580.1234

For better understanding the process of particle coating by chemical vapor deposition (CVD) in the fluidized bed, the simulation of the deposition process was combined with a discrete particle model (DPM). Based on the experimental results of the thermal decomposition of tri-isobutyl-aluminum (TIBA) to produce aluminum onto glass beads, mechanisms on the micro-scale were investigated by single particle tracking. Zones of excessive growth as well as zones of insufficient mixing were identified. In particular, the take-up of aluminum was traced for selected particles that exhibited a large mass of deposited aluminum what in turn provides insight into the homogeneity and quantity of the coating throughout the bed material.

Keywords: Chemical Vapor Deposition; Discrete Particle Modeling; Fluidized Bed Reactor; Particle Coating

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Published Online: 2005-12-28

Citation Information: International Journal of Chemical Reactor Engineering, ISSN (Online) 1542-6580, DOI: https://doi.org/10.2202/1542-6580.1234.

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