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Metrology and Measurement Systems

The Journal of Committee on Metrology and Scientific Instrumentation of Polish Academy of Sciences

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Volume 23, Issue 4 (Dec 2016)

Distinguishing the Plateau and Valley Components of Profiles From Various Types of Two-Process Textures

Wiesław Graboń
  • Corresponding author
  • Rzeszow University of Technology, Faculty of Mechanical Engineering and Aeronautics, Al. Powstańców Warszawy 12, 35-959 Rzeszów, Poland
  • Email:
/ Paweł Pawlus
  • Rzeszow University of Technology, Faculty of Mechanical Engineering and Aeronautics, Al. Powstańców Warszawy 12, 35-959 Rzeszów, Poland
  • Email:
Published Online: 2016-12-13 | DOI: https://doi.org/10.1515/mms-2016-0046


This paper presents methods of separating the plateau part for various types of two-process profiles, having the traces of two processes. The traditional method based on the plateau-valley threshold, according to the ISO 13565-3 standard, is not always sufficient, since the valley portion can include plateau roughness. Starting and finishing points of each plateau in the measured profiles should be determined. The procedure found in the technical literature depends on setting not only the plateau-valley threshold but also a lower threshold. This approach was a little modified for profiles that contain both random and deterministic topography components. A new procedure of determination of the lower threshold was proposed for stratified profiles containing two deterministic parts. The valleys can be characterized by their widths and the distance between them. In addition, a description of the material probability curve is proposed.

Keywords: surface topography; two-process texture; material ratio


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About the article

Received: 2016-02-24

Accepted: 2016-05-30

Published Online: 2016-12-13

Published in Print: 2016-12-01

Citation Information: Metrology and Measurement Systems, ISSN (Online) 2300-1941, DOI: https://doi.org/10.1515/mms-2016-0046. Export Citation

© Polish Academy of Sciences. This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License. (CC BY-NC-ND 4.0)

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