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Nanofabrication

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Electroless selective deposition of gold nano-array for silicon nanowires growth

E. Ruiz-Gomes
  • Institut Matériaux Microélectronique Nanosciences de Provence, UMR CNRS 7334, Aix-Marseille Université, 13397 Marseille Cedex 20, France
  • Orsay Physics, 13710 Fuveau, France
  • Other articles by this author:
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/ C. Herrier
  • Corresponding author
  • Institut Matériaux Microélectronique Nanosciences de Provence, UMR CNRS 7334, Aix-Marseille Université, 13397 Marseille Cedex 20, France
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/ A. Gouyé
  • Institut Matériaux Microélectronique Nanosciences de Provence, UMR CNRS 7334, Aix-Marseille Université, 13397 Marseille Cedex 20, France
  • Other articles by this author:
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/ A. Benkouider
  • Institut Matériaux Microélectronique Nanosciences de Provence, UMR CNRS 7334, Aix-Marseille Université, 13397 Marseille Cedex 20, France
  • Other articles by this author:
  • De Gruyter OnlineGoogle Scholar
/ P. Sudraud / A. Delobbe / A. Ronda
  • Institut Matériaux Microélectronique Nanosciences de Provence, UMR CNRS 7334, Aix-Marseille Université, 13397 Marseille Cedex 20, France
  • Other articles by this author:
  • De Gruyter OnlineGoogle Scholar
/ I. Berbezier
  • Institut Matériaux Microélectronique Nanosciences de Provence, UMR CNRS 7334, Aix-Marseille Université, 13397 Marseille Cedex 20, France
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Published Online: 2013-09-10 | DOI: https://doi.org/10.2478/nanofab-2013-0001

Abstract

Nanopatterns of gold clusters on a large surface of oriented Si(111) substrates, from the galvanic displacement of gold salt (via the spontaneous reduction of AuCl4 -), are demonstrated in this work. The Si substrate is patterned by Focused Ion Beam (FIB) prior to being dipped in a gold solution. Here, we show that these patterns lead to successful control of the position and size of gold clusters. Sequential patterning reveals a powerful maskless alternative to surface preparation prior to Si nanowire growth

This article offers supplementary material which is provided at the end of the article.

Keywords: Silicon; Gold; Galvanic displacement; FIB patterning; Lithography; Nanostructures; Nanowires

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About the article

Received: 2013-04-10

Accepted: 2013-08-13

Published Online: 2013-09-10

Published in Print: 2014-01-01


Citation Information: Nanofabrication, Volume 1, Issue 1, ISSN (Online) 2299-680X, DOI: https://doi.org/10.2478/nanofab-2013-0001.

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© 2014 E. Ruiz-Gomes et al.. This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License. BY-NC-ND 3.0

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