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Nanotechnology Reviews

Editor-in-Chief: Kumar, Challa

Ed. by Hamblin, Michael R. / Bianco, Alberto / Jin, Rongchao / Köhler, J. Michael / Hudait, Mantu K. / Dai, Ning / Lytton-Jean, Abigail / Xie, Jianping / Bryan, Lynn A. / Thiessen, Rose / Alexiou, Christoph / Lee, Jae-Seung / Delville, Marie-Helene / Yan, Ning / Baretzky, Brigitte / Burg, Thomas P. / Fenniri, Hicham / Yang, Jun / Hosmane, Narayan S. / Dufrene, Yves / Podila, Ramakrishna / Eswaramoorthy, Muthusamy

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Volume 4, Issue 3

Issues

Ultra-thin films for plasmonics: a technology overview

Radu Malureanu
  • Corresponding author
  • Department of Photonics Engineering, Technical University of Denmark, Oersteds plads, bldg. 343, 2800, Kgs. Lyngby, Denmark
  • Email
  • Other articles by this author:
  • De Gruyter OnlineGoogle Scholar
/ Andrei Lavrinenko
  • Department of Photonics Engineering, Technical University of Denmark, Oersteds plads, bldg. 343, 2800, Kgs. Lyngby, Denmark
  • Other articles by this author:
  • De Gruyter OnlineGoogle Scholar
Published Online: 2015-06-03 | DOI: https://doi.org/10.1515/ntrev-2015-0021

Abstract

Ultra-thin films with low surface roughness that support surface plasmon-polaritons in the infra-red and visible ranges are needed in order to improve the performance of devices based on the manipulation of plasmon propagation. Increasing amount of efforts is made in order not only to improve the quality of the deposited layers but also to diminish their thickness and to find new materials that could be used in this field. In this review, we consider various thin films used in the field of plasmonics and metamaterials in the visible and IR range. We focus our presentation on technological issues of their deposition and reported characterization of film plasmonic performance.

Keywords: plasmonics; ultra-thin films; VIS/IR range

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About the article

Corresponding author: Radu Malureanu, Department of Photonics Engineering, Technical University of Denmark, Oersteds plads, bldg. 343, 2800, Kgs. Lyngby, Denmark, e-mail:


Received: 2015-03-17

Accepted: 2015-05-08

Published Online: 2015-06-03

Published in Print: 2015-06-01


Citation Information: Nanotechnology Reviews, Volume 4, Issue 3, Pages 259–275, ISSN (Online) 2191-9097, ISSN (Print) 2191-9089, DOI: https://doi.org/10.1515/ntrev-2015-0021.

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