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Pure and Applied Chemistry

The Scientific Journal of IUPAC

Ed. by Burrows, Hugh / Weir, Ron / Stohner, Jürgen

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Mechanisms of silicon etching in fluorine- and chlorine-containing plasmas

D. L. Flamm


International Symposium on Plasma Chemistry, International Symposium on Plasma Chemistry, ISPC, Plasma Chemistry, Ninth, Pugnochiuso, Italy, 1989-09-04–1989-09-08

Citation Information: Pure and Applied Chemistry. Volume 62, Issue 9, Pages 1709–1720, ISSN (Online) 1365-3075, ISSN (Print) 0033-4545, DOI: https://doi.org/10.1351/pac199062091709, January 2009

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