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Pure and Applied Chemistry

The Scientific Journal of IUPAC

Ed. by Burrows, Hugh / Weir, Ron / Stohner, Jürgen

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Volume 64, Issue 5 (Jan 1992)

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Chemistry of titanium dry etching in fluorinated and chlorinated gases

F. Fracassi / R. d’Agostino
Published Online: 2009-01-01 | DOI: https://doi.org/10.1351/pac199264050703

Conference

International Symposium on Plasma Chemistry, International Symposium on Plasma Chemistry, ISPC, Plasma Chemistry, X, Bochum, Federal Republic of Germany, 1991-08-04–1991-08-09

About the article

Published Online: 2009-01-01

Published in Print: 1992-01-01


Citation Information: Pure and Applied Chemistry, ISSN (Online) 1365-3075, ISSN (Print) 0033-4545, DOI: https://doi.org/10.1351/pac199264050703.

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