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Pure and Applied Chemistry

The Scientific Journal of IUPAC

Ed. by Burrows, Hugh / Weir, Ron / Stohner, Jürgen

12 Issues per year


IMPACT FACTOR 2016: 2.626
5-year IMPACT FACTOR: 3.210

CiteScore 2016: 2.45

SCImago Journal Rank (SJR) 2016: 0.972
Source Normalized Impact per Paper (SNIP) 2016: 1.049

Online
ISSN
1365-3075
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Volume 66, Issue 6 (Jan 1994)

Issues

The reactive sputtering of oxides and nitrides

R. P. Howson
Published Online: 2009-01-01 | DOI: https://doi.org/10.1351/pac199466061311

Conference

International Symposium on Plasma Chemistry, International Symposium on Plasma Chemistry, ISPC, Plasma Chemistry, Eleventh, Loughborough, UK, 1993-08-22–1993-08-27

About the article

Published Online: 2009-01-01

Published in Print: 1994-01-01


Citation Information: Pure and Applied Chemistry, ISSN (Online) 1365-3075, ISSN (Print) 0033-4545, DOI: https://doi.org/10.1351/pac199466061311.

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Jan Kischkat, Sven Peters, Bernd Gruska, Mykhaylo Semtsiv, Mikaela Chashnikova, Matthias Klinkmüller, Oliana Fedosenko, Stephan Machulik, Anna Aleksandrova, Gregorii Monastyrskyi, Yuri Flores, and W. Ted Masselink
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M Ghanashyam Krishna and A.K. Bhattacharya
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[5]
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[6]
R.P. Howson, N. Danson, and G.W. Hall
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[7]
R.P. Howson, I. Safi, G.W. Hall, and N. Danson
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