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Pure and Applied Chemistry

The Scientific Journal of IUPAC

Ed. by Burrows, Hugh / Stohner, Jürgen

12 Issues per year


IMPACT FACTOR 2017: 5.294

CiteScore 2017: 3.42

SCImago Journal Rank (SJR) 2017: 1.212
Source Normalized Impact per Paper (SNIP) 2017: 1.546

Online
ISSN
1365-3075
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Volume 72, Issue 11

Issues

High-temperature chemical vapor deposition. An effective tool for the production of coatings

G. Wahl
  • Corresponding author
  • Institut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung, Technische Universität Braunschweig, Bienroder Weg 53, D 38108 Braunschweig, Germany
  • Other articles by this author:
  • De Gruyter OnlineGoogle Scholar
/ O. Stadel
  • Corresponding author
  • Institut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung, Technische Universität Braunschweig, Bienroder Weg 53, D 38108 Braunschweig, Germany
  • Other articles by this author:
  • De Gruyter OnlineGoogle Scholar
/ O. Gorbenko / A. Kaul
Published Online: 2009-01-01 | DOI: https://doi.org/10.1351/pac200072112167

Chemical vapor deposition (CVD) processes have a large throwing power and can operate at atmospheric pressure. Therefore, they are economical for many applications. High-temperature CVD processes give a good control of the crystal structure (e.g., epitaxial layers or other special layer structures) and support diffusion processes. The are used, for example, for the following deposition processes: 1) perovskites, 2) yttrium-stabilized ZrO2 layers as ion conductors or heat barrier coatings, 3) aluminide diffusion coatings in long tubes for corrosion protection, and 4) BN on fibers for fiber-reinforced materials. The special properties of the perovskite CVD are discussed in more detail. These processes are described for small- and large-scale applications. The CVD process is simulated by the computer code Fluent.

Conference

International Conference on High Temperature Materials Chemistry (HTMC-X), High Temperature Materials Chemistry, HTMC, High Temperature Materials Chemistry, 10th, Jülich, Germany, 2000-04-10–2000-04-14

About the article

Published Online: 2009-01-01

Published in Print: 2000-01-01


Citation Information: Pure and Applied Chemistry, Volume 72, Issue 11, Pages 2167–2175, ISSN (Online) 1365-3075, ISSN (Print) 0033-4545, DOI: https://doi.org/10.1351/pac200072112167.

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Micro & Nano Letters, 2018
[2]
A.R. Kaul, S.V. Samoilenkov, V.A. Amelichev, G.A. Dosovitsky, A.A. Kamenev, A.S. Mankevich, A.V. Markelov, A.V. Blednov, S.A. Ibragimov, A.I. Kuchaev, and A.P. Vavilov
Physics Procedia, 2012, Volume 36, Page 1434

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