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Pure and Applied Chemistry

The Scientific Journal of IUPAC

Ed. by Burrows, Hugh / Stohner, Jürgen


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Volume 82, Issue 11

Issues

Possibilities of Monte Carlo simulation for examination of nanowhisker growth

Alla G. Nastovjak / Igor G. Neizvestny / Nataliya L. Shwartz
Published Online: 2010-08-02 | DOI: https://doi.org/10.1351/PAC-CON-09-12-03

The kinetic Monte Carlo (MC) model of nanowhisker (NW) growth is suggested. Two variants of growth are possible in the model—molecular beam epitaxy (MBE) and chemical vapor deposition (CVD). The effect of deposition conditions and growth regimes on the whisker morphology was examined within the framework of the vapor–liquid–solid (VLS) mechanism. A range of model growth conditions corresponding to NW and nanotube formation was determined. The suggested MC model was used for analyses of the morphology of the catalyst–whisker interface and for examination of Si–Ge whisker growth.

Keywords: chemical vapor deposition (CVD); molecular beam epitaxy (MBE); Monte Carlo model; nanowhiskers; simulation

Conference

International Symposium on Novel Materials and Their Synthesis (NMS-V) and the 19th International Symposium on Fine Chemistry and Functional Polymers (FCFP-XIX), Novel Materials and their Synthesis, NMS, Novel Materials and their Synthesis, 5th, Shanghai, China, 2009-10-18–2009-10-22

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About the article

Published Online: 2010-08-02

Published in Print: 2010-08-02


Citation Information: Pure and Applied Chemistry, Volume 82, Issue 11, Pages 2017–2025, ISSN (Online) 1365-3075, ISSN (Print) 0033-4545, DOI: https://doi.org/10.1351/PAC-CON-09-12-03.

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