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Zeitschrift für Physikalische Chemie

International journal of research in physical chemistry and chemical physics

Editor-in-Chief: Rademann, Klaus


IMPACT FACTOR 2018: 0.975
5-year IMPACT FACTOR: 1.021

CiteScore 2018: 1.20

SCImago Journal Rank (SJR) 2018: 0.327
Source Normalized Impact per Paper (SNIP) 2018: 0.391

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2196-7156
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Volume 229, Issue 10-12

Issues

Investigation of the Growth Behaviour of Cobalt Thin Films from Chemical Vapour Deposition, Using Directly Coupled X-ray Photoelectron Spectroscopy

Patrick Hervé Tchoua Ngamou
  • Corresponding author
  • Department of Chemistry, Bielefeld University, Universitätsstraße 25, D-33615 Bielefeld, Germany
  • present address: Forschungszentrum Jülich GmbH, Institute of Energy and Climate Research, Wilhelm-Johnen-Straße, D-52428 Jülich, Germany
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/ Achraf El Kasmi
  • Department of Chemistry, Bielefeld University, Universitätsstraße 25, D-33615 Bielefeld, Germany
  • present address: Laboratory LGCVR, Faculty of Sciences and Techniques, University Abdelmalek Essaadi, B.P. 416 Tangier, Morocco
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/ Theodor Weiss
  • Institute of Applied and Physical Chemistry, University of Bremen, Leobener Straße UFT, D-28359 Bremen, Germany
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/ Henning Vieker
  • Department of Physics, Bielefeld University, Universitätsstraße 25, D-33615 Bielefeld, Germany
  • present address: CNM Technologies GmbH, Herforder Straße 155a, D-33602 Bielefeld, Germany
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/ André Beyer
  • Department of Physics, Bielefeld University, Universitätsstraße 25, D-33615 Bielefeld, Germany
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/ Volkmar Zielasek
  • Institute of Applied and Physical Chemistry, University of Bremen, Leobener Straße UFT, D-28359 Bremen, Germany
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/ Katharina Kohse-Höinghaus
  • Department of Chemistry, Bielefeld University, Universitätsstraße 25, D-33615 Bielefeld, Germany
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/ Marcus Bäumer
  • Institute of Applied and Physical Chemistry, University of Bremen, Leobener Straße UFT, D-28359 Bremen, Germany
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Published Online: 2015-08-28 | DOI: https://doi.org/10.1515/zpch-2015-0602

Abstract

Thin films and coatings are a basis for many technological processes, including microelectronics, electrochemistry and catalysis. The successful deposition of metal films and nanoparticles by chemical vapour deposition (CVD) needs control over a number of physico-chemical processes such as precursor and substrate selection, delivery, temperature, pressure and flow conditions. Here, cobalt thin films were deposited by means of pulsed-spray evaporation chemical vapour deposition (PSE-CVD) from ethanol solutions of Co(acac)2 and Co(acac)3 on bare glass and silicon substrates. The physico-chemical properties of the grown films were characterised by XRD (X-ray diffraction), XPS (X-ray photoelectron spectroscopy) and HIM (helium ion microscopy). Co(acac)2 enabled the growth of cobalt metal at lower temperatures than Co(acac)3. The difference in deposition temperature was attributed to the ability of ethanol to reduce Co(acac)2 better than Co(acac)3. In addition, the film deposited from Co(acac)2 exhibited a higher metal content and a less porous structure than that deposited from Co(acac)3. Increasing the substrate temperature enhanced the carbon content because of the thermal decomposition of both precursors. Using a nickel seed layer improved the growth rate until a critical temperature of 360 ℃, at which the thermal decomposition of the precursor becomes predominant. A decrease in the deposition temperature when using the nickel seed layer was only observed with Co(acac)2 precursor; the growth behaviour under these conditions was monitored with a unique UHV-compatible PSE-CVD reactor directly attached to an XPS system and ascribed to an enhancement of its catalytic reduction by ethanol.

This article offers supplementary material which is provided at the end of the article.

Keywords: Cobalt Thin Films; Chemical Vapour Deposition; Cobalt Acetylacetonate; Nickel Seed Layer; In-Situ XPS

Supplementary material

the online version of this article (DOI: 10.1515/zpch-2015-0602) provides supplementary material for authorized users.

About the article

Accepted: 2015-07-28

Received: 2015-03-27

Published Online: 2015-08-28

Published in Print: 2015-10-28


Citation Information: Zeitschrift für Physikalische Chemie, Volume 229, Issue 10-12, Pages 1887–1905, ISSN (Online) 2196-7156, ISSN (Print) 0942-9352, DOI: https://doi.org/10.1515/zpch-2015-0602.

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