Nano-proximity direct ion beam writing

Gediminas Seniutinas 1 , Gediminas Gervinskas 1 , Jose Anguita 2 , Davit Hakobyan 1 , 3 , Etienne Brasselet 3 , and Saulius Juodkazis 1
  • 1 Centre for Micro-Photonics, Faculty of Science, Engineering and Technology, Swinburne University of Technology, Hawthorn, VIC 3122, Australia, & Melbourne Centre for Nanofabrication, 151 Wellington Road, Clayton, VIC 3168, Australia
  • 2 The Institute of Microelectronics Madrid, Isaac Newton, 8 PTM, 28760, Spain,
  • 3 University of Bordeaux, CNRS, Laboratoire Ondes et Matière d’Aquitaine, 351 cours de la libération, 33400 Talence, France


Focused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfaces and micro-optical elements capable to create structured light fields. Surface density of fabricated nano-features, their edge steepness as well as ion implantation extension around the cut line depend on the ion beam intensity profile. The FIB beam intensity cross section was evaluated using atomic force microscopy (AFM) scans of milled line arrays on a thin Pt film. Approximation of two Gaussian intensity distributions describes the actual beam profile composed of central high intensity part and peripheral wings. FIB fabrication reaching aspect ratio of 10 in gold film is demonstrated.

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