Multilayer optics for XUV spectral region: technology fabrication and applications

S. Andreev 1 , A. Akhsakhalyan 1 , M. Bibishkin 1 , N. Chkhalo 1 , S. Gaponov 1 , S. Gusev 1 , E. Kluenkov 1 , K. Prokhorov 1 , N. Salashchenko 1 , F. Schafers 2 , and S. Zuev 1
  • 1 Institute for Physics of Microstructures RAS and X-Ray company, GSP105, 603600, Nizhny Novgorod, Russia
  • 2 BESSY II, Albert Einstein St. 15, D-12489, Berlin, FRG

Abstract

We present research investigations in the field of multilayer optics in X-ray and extreme ultra-violet ranges (XUV), aimed at the development of optical elements for applications in experiments in physics and in scientific instrumentation. We discuss normal incidence multilayer optics in the spectral region of “water window”, multilayer optics for collimation and focusing of hard X-ray, multilayer dispersing elements for X-ray spectroscopy of high-temperature plasma, multilayer dispersing elements for analysis of low Z-elements. Our research pays special attention to optimization of multilayer optics for projection EUV-lithography (ψ-13nm) and short period multilayer optics.

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